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Chemistry for Electronic Materials
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The chemical aspects of materials processing used for electronic applications, e.g. Si, III-V compounds, superconductors, metallization materials, are covered in this volume. Significant recent advances have occurred in the development of new volatile precursors for the fabrication of III-V semiconductor and metal [Cu, W] films by OMCVD. Some fundamentally new and wide-ranging applications have been introduced in recent times. Experimental and modeling studies regarding deposition kinetics, operating conditions and transport as well as properties of films produced by PVD, CVD and PECVD are discussed. The thirty papers in this volume report on many other significant topics also. Research workers involved in these aspects of materials technology may find here some new perspectives with which to augment their projects.
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Titles in the series (33)
Ceramic Materials Research Rating: 4 out of 5 stars4/5Metastable Alloys: Preparation and Properties Rating: 0 out of 5 stars0 ratingsPhoton, Beam and Plasma Assisted Processing: Fundamentals and Device Technology Rating: 0 out of 5 stars0 ratingsRare-Earth Permanent Magnets Rating: 0 out of 5 stars0 ratingsHigh T<INF>c</INF> Superconductors: Preparation and Application Rating: 0 out of 5 stars0 ratingsDeep Implants: Fundamentals and Applications Rating: 0 out of 5 stars0 ratingsSuperconducting and Low-Temperature Particle Detectors Rating: 0 out of 5 stars0 ratingsScience and Technology of Defects in Silicon Rating: 0 out of 5 stars0 ratingsMagnetic Thin Films, Multilayers and Superlattices Rating: 0 out of 5 stars0 ratingsAcoustic, Thermal Wave and Optical Characterization of Materials Rating: 0 out of 5 stars0 ratingsSolid State Ionics Rating: 0 out of 5 stars0 ratingsMetallurgical Coatings and Materials Surface Modifications Rating: 0 out of 5 stars0 ratingsInterfaces in Biomaterials Sciences Rating: 0 out of 5 stars0 ratingsBeam Processing and Laser Chemistry Rating: 0 out of 5 stars0 ratingsSilicon Molecular Beam Epitaxy Rating: 0 out of 5 stars0 ratingsHigh Energy and High Dose Ion Implantation Rating: 0 out of 5 stars0 ratingsHigh T<INF>c</INF> Superconductor Materials Rating: 0 out of 5 stars0 ratingsMetal Matrix Composites Rating: 0 out of 5 stars0 ratingsSiGe Based Technologies Rating: 0 out of 5 stars0 ratingsSurface Processing and Laser Assisted Chemistry Rating: 0 out of 5 stars0 ratingsSiC, Natural and Synthetic Diamond and Related Materials Rating: 0 out of 5 stars0 ratingsSemiconductor Materials Analysis and Fabrication Process Control Rating: 0 out of 5 stars0 ratingsNuclear Materials for Fission Reactors Rating: 0 out of 5 stars0 ratingsAnalytical Techniques for the Characterization of Compound Semiconductors Rating: 3 out of 5 stars3/5Laser Surface Processing and Characterization Rating: 0 out of 5 stars0 ratingsNuclear Methods in Semiconductor Physics Rating: 0 out of 5 stars0 ratingsClays and Hydrosilicate Gels in Nuclear Fields Rating: 0 out of 5 stars0 ratingsChemistry for Electronic Materials Rating: 0 out of 5 stars0 ratingsModifications Induced by Irradiation in Glasses Rating: 0 out of 5 stars0 ratingsPolyconjugated Materials Rating: 0 out of 5 stars0 ratings
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Chemistry for Electronic Materials - Elsevier Science
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