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ABSTRACT
INTRODUCTION
The control of surface microstructure of transition metal thin film has both
scientific and technological importance. Electrodeposition is one of convenient
techniques that can control the surface morphology and the crystal orientation of
thin metal films. Electrodeposition is used to improve contact resistance,
reflection properties of material and to impart friction properties. It is also used to
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EXPERIMENTAL PROCEDURE
The copper fractal electrodeposits were grown in a flat circular cell (see Figure 1
for a schematic representation) with a copper wire cathode (1 mm in diameter) at
the center and a copper ring anode (thickness 0.5 mm, outer diameter 70 mm and
inner diameter 50 mm). Copper sulfate solutions were made up using
CuSO4.5H2O in 0.5 M H2SO4. The depth of the aqueous film can be varied by
regulating the total volume of the CuSO4 solution. The copper was
electrodeposited with a series of voltage; from 4 volt to 6 volt and finally to 8
volt. A Ferrite and neodymium permanent magnets were used to provide a weak
(18 gauss) and strong (31 gauss) magnetic field, respectively. In the experiment
with variations in orientation of magnetic field effect, the magnet used was
aligned at a series of degree at each turn of experiment. The degrees are 0, 45, 90,
135 and 180. The resulting fractal patterns were photographed using a digital
camera and than analysed using matlab image processing. A mass microbalance
was used to measure the mass of fractal electrodeposits.
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EXTERNAL
A FLAT CIRCULAR CELL
(b) (c)
( )
Meanwhile, under the influence of magnetic field, the clusters or aggregates are
observed to be much denser and more compact due to the presence of magneto-
hydrodynamic effect (Figure 2b and Figure 2c). This magneto-hydrodynamic
(MHD) effect is actually generated by the magnetic force and as the magnetic
field strength increases, the strength of the MHD effect increases as well.
Consequently, the MHD effect is much stronger in the case of Figure 2c than
Figure 2b (Mogi & Kamiko, 1996).
MHD effect acts by reducing the thickness of the Nernst diffusion layer. When
the thickness is reduced, the screening effect within the layer is reduced as well
(Mogi et al., 1995). Subsequently, more copper ions are able to discharge at a
given point in the deposition area. Thus, the overall aggregate will become more
compact. Besides that, before the branches starts to elongate, the random walker
or free ion will also tend to discharge at a higher rate within the fjord area.
Consequently, it will cause the aggregate to grow at a more uniform pattern as
shown in Figure 2b and Figure 2c.
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The MHD effect also will cause a turbulent flow near the deposition area which
will enhance the ionic mass transfer. As more charged ions are present within the
vicinity of the deposition area, the cluster or aggregate is somehow more uniform
in shape as the turbulent flow is able to provide sufficient metal ion to each
branch during the growing process. The additional metal ion introduced by the
turbulent flow will also encourage more side branches to develop beside the main
branch (Hinds et al., 2001).
0.04
Mass Deposited (gr)
0.03
0.02
0.01
0
4 6 8
Voltage (V)
Based on the results obtained from the experiment, the size of the copper
agregates increase proportionately to the magnitude of the electrical potential.
From the tiny dendritic structure in Figure 3a, the aggregate structure increases in
its size to a larger dendritic structure (Figure 3b) as the magnitude of the
electrical potential increases. When the electrical potential supplied reaches 8V,
the dendritic structure had already became a large, dense and compact dendrite
(Figure 3c). Besides, the mass of the copper deposited is also found to be
increasing along with the increment in electrical potential supplied. This can been
seen in the Figure 4.
The increase in the size of the aggregate and the mass deposited is contributed
by the increment in the electrical potential supplied. When the electrical potential
is increased, it will induce a higher charge at the electrode. Thus, the anode and
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(d) (e)
From the results obtained, the aggregate pattern is the most compact when the
magnet is placed at 0o from vertical plane and as the magnet is tilted; the
aggregate becomes more random branched. The branching is most apparent when
the magnet is tilted to 90o from vertical plane as seen from Figure 5b. However,
as the magnet is tilted ever further from the horizontal plane, again we notice the
pattern become less branching. The aggregate also returns to its original pattern
which is denser and compact (Figure 5e). At this point, the magnet is at 180o
from vertical plane.
The aggregate is most compact and dense when the magnet is placed at 0o from
vertical plane as the magnetic force is parallel to the cathode surface.
Consequently, the magnetic field is oriented directly perpendicular to the
direction of the ion fluxes at the deposition site. When the external magnetic
force is directly perpendicular to the direction of the ion flux, the magnetic force
is the strongest (Nikolic et al., 2004, Bund et al., 2003). Thus, the MHD effect is
also the strongest at this placement
CONCLUSIONS
The effect of the magnetic field on copper electrodeposition has been studied
using a flat electrochemical cell. It is found that the growth of fractal
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ACKNOWLEDGMENT
REFERENCES
Bund, A., Koehler, S., Kuehnlein, H.H., Plieth, W. (2003). Magnetic field effects
in electrochemical reactions. Electrochimica Acta 49, pp 147-152.
Coey, J. M. D., Hinds, G. (2001). Magnetic electrodeposition. Journal of Alloys
and Compounds 326: 238 – 245.
Hinds, G., Spada, F. E., Coey, J. M. D., Ni Mhiocha´in, T. R., Lyons, M. E. G.
(2001) Magnetic field effects on copper Electrolysis. J. Phys. Chem B 105:
9847-9502.
Matsushima, J.T. , Trivinho-Strixino, F., Pereira, E.C. (2006). Investigation of
cobalt deposition using the electrochemical quartz crystal microbalance.
Electrochimica Acta 51: 1960–1966.
Mhiochain, T.R., Hinds, G., Martin, A., Chang, E., Lai, A., Costiner, L., Coey,
J.M.D., (2004). Influence of magnetic field and gravity on the morphology of
Zinc fractal electrodeposits. Electrochimica Acta 49: 4813-4828.
Mogi, I., Kamiko, M., (1996). Striking effects of magnetic field on the growth
morphology of electrochemical deposits. Journal of Crystal Growth 166: 276-
280.
Mogi, I., Kamiko, M., (1996). Striking effects of magnetic field on the growth
morphology of electrochemical deposits. Journal of Crystal Growth 166, pp
276-280.
Mogi, I., M. Kamiko, S. Okubo, (1995). Magnetic field effects on fractal
morphology in electrochemical deposition, Physica B 211 pp 319-322.
Nikolic, N.D., Wang, H., Cheng, H., Guerrero, C.A., Garcia, N. (2004). Influence
of the magnetic field and magnetoresistance on the electrodeposition of Ni
nanocontacts in thin films and microwires. Journal of Magnetism and Magnetic
Materials 272-276: 2436-2438.