References

G U H A , A., BRISTOW. J , SULLIVAN, c . , and HUSAIN. A.: Optical interconnections for massively parallel architectures, Appl. Opt., 1990, 29, (8)
BRISTOW, J.P.G., SULLIVAN, C.T, HUSAIN, A.: Polymer waveguide GUHA, A., EHRAMJIAN. J . ,

and

based optical backplanc for fine grained computing. SPIE Proc., 1990, Vol. 1178, p. 103
NORDIN, R.A., LEVI, A.F.J., NOITENBERC, R.N., O G O R M A N , J., TANBUNEK. T., and LOGAN. R.A.: A system perspective on digital

interconnection technology, J. Lightwuve Techno/., 1992, 10, (6), pp. 81 1-827

WONG, Y.M., MUEHLNER, D J., FAUIXKAR, C.C., BUCHHOLZ, D.B., PISHTEYN, M., BRANDNER, J L., PARZYNAI. W.J., MORGAN, R A . , MULLALLY, T., LEIBENGUIH. R.E., GUTH, G . D , POCHL, M.W., GLOGOVSKY, K G . , ZILKO, J.L., GATES, J . V , ANTHONY, P.J., TYRONE. B H , IRELAND, T J , LEWIS, D H., SMITH, D.F., NATI, S., LEWIS, D K., AISPAIN, H A . , GOWDA, S , WALKER, S G . , KWARK. Y H., BATES, K.J.S., KUCHTA, D M., and CROW, J.D.: Technology

development of a high density 32-channel 16 Gbis optical data link for optical interconnection applications for the optoelectronic technology consortium (OETC), J. Liglitwuve Techno/., 1995, 13, pp. 995-1016 KARSTENSEN, H , HANKE. CH., and tIONSBERG, M : Dc couple parallel optical interconnect cable with fiber ribbon. Proc. 43rd ECTC, 1993, Orlando, FL, pp. 729-734
TAKAI, A., KATO, T., YAMASHITA. S., HANATANI, S., MOTEGI. Y., ITO, K., ARE, H., and KODERA, 1-1.: 200Mbisich l0Om optical subsystem

the fibre photosensitivity by hydrogen- or deuterium-loading, followed by exposure to total fluences of several kJ/cm2 [7].Chromeon-silica photolithography masks have been used, although their damage threshold is -100mJ/cm2 [l]. The erratic intensity profile of an excimer laser can limit average intensities to < 50mJ/cniZ, which increases exposure times. Also, in our experience, the index change depends not only on the total fluence of the exposure, but also on the intensity of the exposing pulses. This makes it difficult to produce high-attenuation LPGs using a chrome mask without extreme (2-3mol%) H,- or DJoading [I], and leads to the idea that dielectric masks might offer improved power handling ability. Dielectric masks have also been used in excimer laser ablation applications [SI. We have produced amplitude masks in-house by selectively etching commercial KrF excimer laser mirrors. Preliminary tests showed that the > 99% reflecting layers could be easily and selectively removed, with minimal effect on the silica substrate. We have patterned the etching by directly exposing a photoresist resin with a focused argon laser beam. To our knowledge, this is the first published report of direct laser patterning of a dielectric mirror amplitude mask for long period grating fabrication. Fabrication: A commercial photoresist (Hoechst AZ 5214) was spun to a thickness of 1 . 2 on ~ a clean, 5cm diameter high power KrF excimer laser mirror (CVI part # KRF-2037-O), then baked at 90C for 35min in a convection oven. An argon laser (Coherent Innova 90-6) configured for multi-line, single transverse-mode operation in the 351-363nm range was expanded with a 3x telescope to improve intensity uniformity at the image position. One dimension of the collimated, Gaussian beam was restricted by a -1 slit placed before a 5 0 focal length fused silica cylindrical lens oriented with the cylinder axis perpendicular to the slit. x 1 0 p n at the subThese optics formed a line image of -1 strates surface. A motorised stage translated the mask in the plane of its surface and perpendicular to the axis of the line at a constant rate so that the focused line swept out a 1 mm wide path on the photoresist. To produce the desired periodic pattern, an electro-mechanical shutter placed before the telescope imposed a square-wave modulation on the beam in synchrony with the motion of the translation stage. Exposures ranging from 40 to 130mJ/cm2 were sufficient for total removal of the exposed photoresist during developing, without broadening the exposed areas through blooming. After developing the photoresist, the exposed areas of the dielectric mirror were etched away using a solution of 5% HF acid in deionised water; the remaining photoresist was then removed with solvents.

interconnections using 8 channel l.3pm laser diode arrays and single mode fiber arrays, ./. Liglztwuve Techno/., 1994, 12, (2), pp. 260-269 OTA, Y., and SWARTZ, R.G.: Multichanncl parallel data link for optical communication, IEEE L T S , 1991, 2, (2), pp. 24-~32 YAMANAKA, N., SASAKI, M , KIKUCHI, s., TAKADA, T , and IDDA. M.: A gigabit rate five highway GaAs OE-LSI chipset for high speed optical interconnections between modules or VLSIs, IEEE J . Se/. Areus Commun., 1991, 9, ( 5 ) , pp. 689-696 DUTTA, N.K., WANG, s.J., W Y N N , J.D., LOPATA. J., and LOGAN, R.A.: Investigations of laser array for parallel optical data link applications, Appl. Plzys. Lett., 1992, 61, (2), pp. 130-132

Amplitude mask patterned on an excimer laser mirror for high intensity writing of long period fibre gratings
H.J. Patrick, C.G. Askins, R.W. McElhanon and E.J. Friebele
Indexing terms: Gratings in fibres, Mu.slzs

Masks have been produced for long period fibre grating fabrication from commercial dielectric laser mirrors. The masks, which were produced by direct patterning of a photoresist using an argon laser, can withstand in excess of 200mJ/cm2 per 15ns pulse of 248nm laser light. The use of these masks decreased exposure times by 90% and nearly doubled the attenuation (dB) of a long period grating produced by a given UV fluence compared to chrome-on-silica masks.

Introduction: Long-period fibre gratings (LPGs) provide prominent attenuation bands at specific wavelengths in optical fibre, and have been applied for band-rejection [11, gain-flattening of erbiumdoped fibre amplifiers [2], sensing of strain, temperature, and refractive index [3, 41, and fibre Bragg grating sensor demodulation [5]. An LPG is a periodic modulation of the index of refraction in the fibre core, typically with a period > 1 O O p and a length of a few cm, which is induced by patterned irradiation of the fibre with an intense UV source, such as a KrF excimer laser. The pattern is usually defined by a mask, but can also be defined by using point-by-point exposure [6]. An amplitude mask permits the repeated use of a precision manufactured optic to produce multiple LPGs with little requirement for precision during the writing exposure. Producing LPGs of a few centimetres in length with attenuation bands of greater than a few decibels requires large refractive index modulations (An > 1W). This is generally achieved by enhancing

Fig. 1 Photogruph ofxection qf,fini.shed dielectric n m k

Results und discussion: Fig. 1 is a photograph of a completed mask with a period of 3 O O p m taken under low magnification with visible light. Most of the surfkc is still covered by the dielectric stack (dark grey), while the areas where the mirror has been etched away appear light grey. Transmission of the patterned region at 248nm was measured to be 4196, while 46% would be expected for a 50% duty cycle mask with two 4% Fresnel reflections. The mask was found to withstand several dozen 15ns pulses at 200mJ/cm2 transmitted intensity per pulse without damage. At 250mJ/cmZper pulse, ablation of the reflecting layers at the boundary between etched and un-etched areas was seen after a few tens of pulses.

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Considering the presence of hot spots in the excimer beam, the actual damage threshold was probably higher than 250mJ/cm2.

J = T I
-10

minute, and > 20 masks per mirror can be developed and etched in a day. The masks enable rapid writing of LPGs with up to 25dB attenuation in fibre with moderate H2-loading.

Acknowledgments: We gratefully acknowledge helpful conversations with T. Erdogan and A.D. Kersey, and thank D.L. Griscom for his assistance with the etching studies. We thank Bell Ldbordtories, Lucent Technologies for providing the fibre used in this work. H.J. Patrick acknowledges the support of an American Society for Engineering Education postdoctoral fellowship. This work was supported in part by the Office of Naval Research.
0 IEE 1997
Electrorzics Letters Online No: 19970780
H.J. Patrick, C.G. Askins, R.W. McElhanon and E.J. Friebele (Naval Research Laboratory, Opticul Sciences Division, Code 5600, 4555 Overlook Avenue S W, Washington, DC 20375, USA)

2 May 1997

-10

1
1.2

W
5

References
1 5

1180121 Fig. 2 Transmission spectra of 3 0 0 p period ~ LPGs written using either a chrome or dielectric musk

l 3 A,pm

1 L

1 2

VENGSARKAR. A M., LEMAIRE, P.J., JUDKINS, J B , BHATIA, V., ERDOGAN, T., and SIPE. J E : Long-period fiber gratings as band-

rejection filters, J. Lightwave Teclznol., 1996, 14, pp. 58-64 Long-period fiber-gratingbased gain equalizers, Opt. Lett., 1996, 21, pp. 336-338 3 BHATIA, v , and VENGSARKAR, A.: Optical fiber long-period grating sensors, Opt. Lett., 1996, 21, pp. 692-694 4 PATRICK, H.J., WILLIAMS, G.M., KERSEY, A D , PEDRAZZANI, J.R., and VENGSARKAR. A M.: Hybrid fiber Bragg gratingilong period fiber grating sensor for straidtemperature discrimination, IEEE Photonics Technol. Lett., 1996, 8, pp, 1223-1225 5 PATRICK, H.J , KERSEY. A.D., PEDRAZZANI, J.R., and VENGSARKAR, A.M.: Bragg grating sensor demodulation system using in-fiber long period grating filters, to be published in Distributed and Multiplexed Fiber Optic Sensors VI, Proc. SPIE, 2838 6 HILL, K o., MALO, B , VINEBERG, K A , BILODEAU, F , JOHNSON. D c., and SKINNER, I : Efficient mode conversion in telecommunication fibre using externally written gratings, Electroii. Lett., 1990, 26, pp. 1270-1272 7 LEMAIRE, P.J., ATKINS, R M . , MIZRAHI, V., and REED, W.A.: High pressure H, loading as a technique for achieving ultra-high UV photosensitivity and thermal sensitivity in GeO, doped optical fibres, Electron. Lett., 1993, 29, pp. 1191-1193 , Projection laser 8 PATEL, R.s., ADVOCATE, W.H , and M U K K A V I L L I s.: ablation mask alternatives, Int. J. Microcircuits Electron. Parkug., 1995, 18, pp. 388-393
VENGSARKAR, A.M., PEDRAZZANI, J.R., BERGANO, N.S., and DAVIDSON, C.R.: JUDKINS, J.B., LEMAIRE, P.J.,

a Chrome, IOHz, 23mJ/cm2 per pulse, IOmin b Dielectric, lOHz, 120mJ/cm2 per pulse, lmin c Dielectric, lOHz, 120mJ/cm2 per pulse, IOmin

To measure the advantage of writing LPGs with a dielectric against chrome-on-silica mask, each was used for writing 2.1cm long LPGs with a 300pn period in Lucent Technologies dispersion-shifted fibre. The fibre had been hydrogen loaded under 12OOpsi at 70C for several weeks, for an estimated [HJ of O.Smol%. As shown in Fig. 2, using the chrome mask at IOHz, 23mJ/cm2 per pulse, the transmission of the deepest attenuation band was -1 dB after lOmin (Fig. 2u). In contrast, the attenuation of the grating written using the dielectric mask at lOHz, 120mJ/ cm2 per pulse, reached -1dB after only lmin (Fig. 2b) and -9dB after lOmin (Fig. 2c). In other exposures we have seen as much as -25dB attenuation after 10 min at lSHz, with 18SmJ/cm2 per pulse with the dielectric mask. We also monitored the depth of the largest attenuation band against UV fluence for high and low intensity exposures, as shown in Fig. 3. After 1.15kJ/cm2 per pulse, attenuation of the grating written at low intensity (chrome mask, 28min at 30Hz, 23mJ/cm2 per pulse) had only reached 6dB, while that of the grating written at a higher intensity (dielectric mask, 8min at 5Hz followed by 4min at 30Hz, 120mJi cm2 per pulse) was -1 1dB. Intensities were measured after transmission through the masks to ensure that this effect was not due to a difference in mask attenuation, and similar results were obtained when the dielectric mask was used for both the high and low intensity exposures. Ths confirms that the use of higher intensity pulses not only decreases exposure times, but also generates LPGs with a greater attenuation for a given UV fluence.

COST 241 intercomparison of nonlinear

refractive index measurements in dispersion shifted optical fibres at h = 1550nm
A. Fellegara, M. Artiglia, S.B. Andreasen, A. Melloni, F.P. Espunes and S. Wabnitz
Indexing terms: Optical fibres, Optical dispersion
COST 241 measurements of the nonlinear refractive index, n2, exhibit a large scatter depending on the specific measurement technique. This is largely due to the electrostrictive contribution to the Kerr nonlinearity, as is revealed by the resonant behaviour of n, (with peak values up to 3.9 1W0ni2W-) observed with signal modulation frequencies in the 0.1-1 CHz range.

fluence, J/cmL Fig. 3 Transmission of largest uttenuation band aguinst UV puence using chrome and dielectric musks

-A-

--O--120mJ/cm2 per pulse, dielectric

Conclusions: We have demonstrated a technique which allows researchers with access to a UV-adapted argon laser and a photoresist spinner to produce robust masks for LPG fabrication inhouse. The same mirror can be coated with photoresist, exposed, and etched many times. A single pattern is exposed in less than a

23mJ/cm2 per pulse, chrome

Introduction: The intensity-dependent contribution to the refractive index of optical fibres, n2, is responsible for well-known nonlinear effects such as self-phase modulation (SPM), cross-phase modulation (XPM), and modulation instability (MI). As these fibre nonlinearities are a major source of impairment in all-optical transmission systems operating close to the zero-dispersion wavelength, a study group devoted to the intercomparison of different measurement methods for evaluating n2was activated in the frame

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