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Hard Coating Solutions Page
Aluminum-Based Composite Materials Other Metallic Composites Ceramics Pure Elements Services & Accessories
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Data concerning the condition or recommendations for the use of materials and products are given for information only. All data are based on practical experience. Information referring to the existence of specific properties is given to the best of our knowledge, but does not imply any guarantee. Any assurances in this respect must always be obtained specifically in writing. All rights reserved, in particular for translation into foreign languages. Reproduction of any part of this brochure is not permitted without the express consent of PLANSEE.
Right picture on page 3 with the permission of Hauzer Techno Coating. Left picture on page 3 with the permission of Schaeffler Technologies GmbH.
(Al, Cr)2O3 coatings have been introduced to the coating market quite recently. These new types of PVD coatings are intended to compete with Al2O3 coatings produced by CVD. As the PVD process is limited in temperature, the formation of pure alpha-aluminumoxide is not possible yet. The addition of Cr to the target material results in a growth of mixed (Al, Cr)2O3 in the preferred corundum structure. PLANSEEs AlCr target materials are of the highest purity, density and homogeneity. The powder metallurgical production routes allow us to introduce other additional elements for creating tailored coatings. From the pictures of microstructure below it can be seen that PLANSEE has a wealth of experience with different compositions in the AlCr binary system. Beyond that, also many ternary and quarternary AlCr targets have been successfully produced.
Titanium-Aluminum
TiAl-based coatings are used for various applications to improve/generate: - surface hardness - corrosion resistance - oxidation resistance - decorative colors - wear resistance
Our powder metallurgically produced TiAl targets are characterized by several advantageous properties such as high density, uniform elemental distribution, fine-grained microstructure and a low content of residual impurities. Due to the typical microstructure of powder metallurgical TiAl targets, where pure Ti-particles are embedded into a pure Al-matrix, the thermal as well as electrical conductivity is twice as high as for cast -TiAl material. Therefore PLANSEEs TiAl-based targets show improved performance. In the case of arcing cathodes, a simple substitution from cast-type to powder metallurgical TiAl achieved similar tool life, without the need to change process parameters. High quality is guaranteed by many years of experience and the selection of high purity powders sourced from long-standing and reliable partners. Due to the combination of our advanced production expertise and extensive quality assurance processes, PLANSEE products achieve outstanding results.
Material properties PLANSEE produces powder metallurgical TiAl targets and cathodes ensure constant quality in a wide range of material compositions. The unique advantages of powder metallurgically manufactured TiAl arc cathodes and sputter targets include:
Thermal conductivity [W/mK]
- high ductility of Al-based microstructure prevents crack formation in the target during use. This guarantees a high utilization for each target - high thermal conductivity due to Al matrix compound microstructure - high homogeneity due to uniform distribution of Ti grains in Al matrix - highest stability of material quality due to selected raw materials as well as constant manufacturing process
70 60 50 40 30 20 10 0 50 100
TiAl 50 / 50 at% molten quality TiAl 50 / 50 at% PLANSEE pm-standard quality TiAl 50 / 50 at% PLANSEE pm-finegrain quality
150
200
250
300
350
400
450
500
Temperature / C
Thermal conductivity of different TiAl 50/50 at% target qualities
Using different raw material powders and densification processes the microstructure of the target material can be influenced to meet special customer requirements. For example, droplet rate and droplet size can be influenced by the grain morphology (see picture above). On the other hand, this effect seems to be related to the PVD equipment type also. Some scientific investigations concerning the effect of target microstructure on deposited coatings have been carried out by PLANSEE. In a study, cast and powder metallurgical TiAl 50/50 at% targets were used in an arc-ionplating system from Oerlikon Balzers (type BAI 1200) to deposit coatings using a standard coating recipe. Both types of targets produced coatings that had similar coating structure and composition. Milling tests showed the average droplet size and distribution can be further improved, using fine grained PM targets.
Cross section of a coated sample using cast-type TiAl 50/50 at% targets deposited in an Oerlikon Balzers BAI 1200 coating unit
Cross section of a coated sample using PM (fine grain) TiAl 50/50 at% targets deposited in an Oerlikon Balzers BAI 1200 coating unit
TiAl 50/50at% can be manufactured either via powder metallurgy (PM) or casting technology. For PM production the target consists of fine Ti particles homogeneously embedded in a ductile Al-matrix. The cast target, on the other hand, consists of different brittle phases of TiAl intermetallics. During the arc evaporation process, a local melting of the target material happens at the arc spot. Therefore the surface of the PM target transforms to a similar structure as is usually seen for cast-type targets. During the conditioning process, before the actual coating cycle, a thin layer (~3-5m) of TiAl intermetallic phases is already formed at the target surface.
to demonstrate that cast-type TiAl 50/50 at% can be easily replaced by powder metallurgical material, resulting in similar coating structure and performance. More detailed results of this investigation may be found in the following publication: Impact of the targets microstructure on the microstructure of the cathodic arc evaporated Ti0.5Al0.5N coatings by D. Rafaja et. al., Proceedings 17th INTERNATIONAL PLANSEE SEMINAR, Vol. 2 (2009) Reutte, Austria, HM38/1.
103 (a)
102
101
(b)
100
(c)
10-1
30
40
50
60
70
80
90
For the remaining wide range of typically-used compositions of the TiAl system (other than the TiAl 50/50 at%), there has never been an alternative to PM targets, as casting technology would not be able to overcome some of its intrinsic disadvantages, like segregation and pore formation. Graphic: Diffraction patterns of the Ti0.5Al0.5N coatings deposited at UB = -80 V from a cast-type cathode (a) and from a coarsegrain and fine-grain cathodes produced using powder metallurgy (b and c, respectively). Thin solid lines indicate the respective background intensity. Positions of the diffraction lines are labelled at the bottom of the figure. The order of phases is as follows: WC (substrate), fcc Ti0.5Al0.5N, fcc AlN, wurtzitic AlN (from top to bottom).
TiAl 50/50 at% arc cathode with Al heat sink for improved thermal conductivity
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Boron
10.81 3
12.01 4 2
14.01
3 5 4 2
23
50.94
5 4 3 2
41
92.91 5 3
73
180.95 5
B
8
Carbon
C
16
Nitrogen
N
14
Vanadium
V
24
Niobium
Nb
[Kr]4d45s
Tantalum
Ta
74
1s2sp1
1s22s2p2
1s22s2p3
[Ar]3d34s
[Xe]4f145d36s
16.00 -2
32.06
2 4 6
26.09 4
52.00 6 3 2
42
93.94
6 5 4 3 2
183.85
6 5 4 3 2
Oxygen
Sutfur
Silicon
Si
Chromium
Cr
[Ar]3d54s
Molybdenum
Mo
[Kr]4d55s
Tungsten
1s22s2p4
[Ne]3s2p4
[Ne]3s2p
[Xe]4f145d46s
81
204.37 3 1
40
91.22 4
72
178.49 4
12
24.31 2
28
Nickel
58.70 3 2
27
Cobalt
58.93 3 2
Thallium
Ti
21
Zirconium
Zr
39
Hafnium
Hf
58
Magnesium
Mg
[Ne]3s
Ni
47
Co
[Ar]3d74s 1 12.2 4423 2523
[Xe]4f145d106s2p1
[Kr]4d5s
[Xe]4f145d6s
[Ar]3d84s
44.96 3
88.91 3
140.12 3 4
29
63.55 2 1
107.87
44
101.07
8 6 4 3 2
Scandium
Sc
[Ar]3d4s
Yttrium
Ce
[Xe]4f5d6s
Cerium
Cu
[Ar]3d104s1
Copper
Ag
[Kr]4d105s1
Silver
Ruthenium
Ru
[Kr]4d75s1
[Kr]4d5s
Overview
The following sputtering targets and arcing cathodes are offered by PLANSEE in a wide range of compositions: - Titanium composites and alloys: Ti-Si, Ti-Cr, Ti-B, Ti-Zr - Chromium composites and alloys: Cr-Si, Cr-B - Zirconium composites and alloys: Zr-Si, Zr-B - Molybdenum composites and alloys: Mo-Cu, Mo-Ag
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Titanium-Silicon
For applications like dry, high-speed cutting of high performance materials, PLANSEE recommends the use of TiSiN coatings. Due to the high hardness and highest oxidation resistance of TiSiN nanocomposites, these coatings significantly extend the life time of tools. PLANSEE offers a range of TiSi targets in standard compositions that are produced using powder metallurgical technology. Upon your request, PLANSEE also produces individual compositions with Si contents up to 25 at%.
Product benefits: - Uniform element distribution in the target due to advanced powder metallurgical production route - Fine grained microstructure optimized for sputtering targets as well as for arcing cathodes - High strength and ductility due to the microstructural composition: TiSi/Ti5Si3 grains embedded in Ti matrix - Guaranteed high density of > 98% of the theoretical density - High target/cathode purity due to high purity powder ingredients - Due to PLANSEEs licensing agreement, customers who are using our TiSi targets are free to produce TiSiN coatings which are covered under Japanese Patent JP-3765475 (of Hitachi Metals Ltd.)
Product portfolio: - TiSi 90/10 at%, TiSi 85/15 at%, TiSi 80/20 at% and TiSi 75/25 at%
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Molybdenum-Copper
Advanced PVD coatings already play an important role in automotive applications for reducing the friction losses and, as a consequence, increasing the fuel efficiency. Nano-composite coatings based on hard metal nitrides surrounded by a soft (not nitride-forming) metal, exhibit high hardness, low friction and high wear resistance. For reasons of coating process stability, MoCu sputtering targets with a high volume fraction of molybdenum are best suited to deposit such coatings. During the reactive PVD process the molybdenum will form its nitride while copper is inert in nitrogen atmosphere and therefore will deposit as a metal. For arc ion plating, specially designed MoCu cathodes are available on request.
Product benefits: - Fine-grained microstructure with uniform distribution of molybdenum grains in a copper matrix - High density (>98%) in a wide composition range - High target purity due to high purity powder ingredients
Product portfolio: - Mo-Cu according to customer request with Mo content from 40 to 90 at%
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Ceramics
Using the advantages of powder metallurgy, mixtures of different ceramic compounds are also available as sputtering targets and cathodes for arc evaporation. By adjusting the microstructure with additions of carbon, a new spectrum of compositions is available. These are mainly dedicated for advanced hard coatings in the field of tools and tribological coatings for components. Examples are WC/C, TiC/C, SiC/C, TiB2/C.
Overview
The following materials are available as sputtering targets. The properties of the materials can also be adapted to meet the conditions of the arc process: - Carbides: WC (binder-free), TiC, B4C, SiC and others on request - Borides: TiB2, CrB2, WB, W2B, ZrB2, NbB2 and others on request - Nitrides like TiN
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Product benefits: - Fine grained microstructure optimized for sputtering with high power density - High strength and thermal shock resistance due to the high temperature and high pressure densification process - Guaranteed high density of > 98% of the theoretical density (corresponds to a specified 4.40 - 4.50 g/cm3) - High target purity (> 99.8 wt% TiB2 content) due to high purity powder ingredients - Unique microstructure developed for arcing cathodes
Product portfolio: - Multiple-piece targets bonded on backing plate (Cu, Mo) - Single piece targets up to 250 x 300 mm - TiB2 cathodes with microstructure and cathode design adjusted for arc ion plating PVD processes
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Product benefits: - Fine-grained microstructure optimized for sputtering with high power density - Binder-free material with guaranteed Ni and Co content below 100 ppm - High strength and thermal shock resistance - Guaranteed high density of > 98% compared to the theoretical density (> 15.50 g/cm3) - High target purity (> 99.9 wt% WC content) due to high purity powder ingredients - Unique microstructure and cathode design developed for arcing cathodes
Product portfolio: - Multiple-piece targets bonded on backing plates (Cu, Mo) - Single piece targets up to 250 x 300 mm - WC cathodes with microstructure and cathode design adjusted for arc ion plating PVD processes
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Pure Elements
Titanium
Unalloyed commercially pure Titanium is available in four different Grades, 1, 2, 3 and 4, which are selected based on the corrosion resistance, ductility and strength requirements of the specific application. Grade 1 has the highest formability, while Grade 4 has the highest strength and moderate formability. For PVD coating applications the most widespread quality in use is Titanium Grade 2. To offer short lead times to our customers, PLANSEE stocks a large and varied inventory of Titanium Grade 2 mill-products such as plate, sheet, billet and bar. PLANSEEs experienced operators are able to deal with complex operations like titanium machining and processing.
Monolithic Ti target
Zirconium
Commercially pure zirconium naturally contains 1-5 percent of hafnium, as it is extremely difficult to separate these two elements from each other. Unalloyed Zirconium is specified as Alloy 702. Zirconium targets are often used for decorative applications as ZrN layers. These are more brass-like in color and offer a higher corrosion resistance than TiN coatings. PLANSEE offers Zirconium targets in every standard dimension.
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Chromium
Many years of experience in powder metallurgy allow PLANSEE to meet the highest requirements with respect to purity, grain structure, density and target geometry. Careful selection of raw materials and the use of the most up-to-date processing technology guarantee the consistently high quality of PLANSEE Cr sputtering targets. According to customers needs PLANSEE employs aluminothermic High Purity (HP) powder or electrolytic Ultra High Purity (UHP) powder.
Material specifications Element Metallic impurities Fe Si others Content of impurities for UHP Cr (99.95 % metallic purity) in g/g 300 100 150 Content of impuities for HP Cr (99.8 % metallic purity) in g/g 1300 400 400
O N C
Cr sputtering target
Cr rotatable targets
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Thermal conductivity 0-100 C (W/mK) 138 401 190 - 240 225 - 240 22
Coefficient of thermal expansion x10-6/K 5.3 16.5 7.5 - 9.9 8.3 - 10.3 8.6
Youngs Modulus (GPa) 320 130 225 - 170 280 - 220 110
WC Cr TiB2
120 94 64
PLANSEE offers in-house bonding capabilities. In most cases we use an indium bond, but also some high temperature soldering is available on request. Please ask for further information.
Graphite foils
PLANSEE offers all items which are necessary for the different types of coatings as well as all items required for mounting our targets including: - Standards like graphite-foils - Non-magnetic screws - Non-magnetic washers - Specially designed clamping bars and holders used for PLANSEE clamping systems
Graphite-foils, mounting screws and washers
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R&D Services
Based on a long history of target development, PLANSEE shares a broad knowledge of target compositions and target designs with its customers. Coating parameters and fixing instructions for the usage of PLANSEE targets have been documented. Also an extensive database is available with recommendations on certain chemical compositions for creating tailored coatings. According to the intrinsic properties of the target material systems, PLANSEE has established a huge variety of in-house manufacturing methods. We individually choose the opimal production route to ensure that our customers receive only fully dense and homogeneous targets, for R&D as well as for standard materials. The PLANSEE R&D team assists you to solve any coating problems and to jointly engineer coating solutions for future demands. Based on the scientific content and depth of the problem, cooperation can be established bi-laterally or include support from scientific partners (universities, institutes). PLANSEE serves all customers with its global network of experts. Main production plant for the Hard Coating Target Materials is PLANSEE Composite Materials GmbH, located in Lechbruck, Germany. This PLANSEE site has its expertise in the production of different metal and ceramic-based composite materials for almost 40 years.
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For more information and local contacts please visit our website:
www.plansee.com
We reserve the right to make technical changes for improvement of the product.