UMC 0.18m Design Rules Revision 0.

2
The University of Western Australia
May 14, 2011

1
1.1

Introduction
Important note

This is not a complete list of design rules, however it should suffice for your designs.
Analog rules as well as threshold modification layers have been removed and certain
rules simplified.
All rules, unless otherwise specified, are in microns.
Note: Information contained in this document was derived from experimentation. This is not an official design document.

1.2

Mask layer definitions

This is a non-exhaustive list of the layers used in this technology node.

Layer
DIFF
NWELL
PO1
NPLUS
PPLUS
METAL1
CONTACT
METALn
MVIAn

Description
Defines active region when overlapping an implant layer.
Defines region where a deep N well is formed. Construct PMOS in this region.
Defines Polysilicon gate.
Defines N+ implant region.
Defines P+ implant region.
Defines the first metal layer.
Defines contact between active area or polysilicon and metal 1.
These are the subsequent metal layers (n from 2-5).
Defines a via between Metal n and Metal n+1 (n from 1-4).

2
2.1

Layout rules
DIFF

The following design rules must be adhered for all the active layer polygons:
Rule
a. Minimum width
b. Minimum DIFF to DIFF spacing
c. Minimum NWELL to NPLUS DIFF spacing
d. Minimum NWELL to PPLUS DIFF spacing
e. Minimum NWELL enclosure of NPLUS DIFF
f. Minimum NWELL enclosure of PPLUS DIFF

e
d

Value
0.24
0.28
0.43
0.24
0.24
0.43

2.2

NWELL

The following design rules must be adhered for all the n Well layer polygons:
Rule
a. Minimum width
b. Minimum spacing when at equal potential
c. Minimum spacing when at different potential

Value
0.9
0.9
1.5

2.3

PO1

The following design rules must be adhered to for all polysilicon layer polygons:
Rule
a. Minimum width
b. Minimum PO1 overhang after diffusion
c. Minimum PO1 width for 45 degree gate
d. Minimum PO1 spacing to end of DIFF
e. Minimum PO1 spacing to related DIFF
f. Minimum PO1 spacing outside DIFF
g. Minimum PO1 spacing to DIFF spacing
e. PO1 90 degree bend NOT ALLOWED.

Value
0.18
0.22
0.2
0.28
0.12
0.1
0.2

1111
0000
0000
1111
0000
1111
0000
1111
0000
1111
0000
1111
0000
1111
0000
1111
0000
1111
0000
1111
0000
1111
0000
1111
0000
1111
c

11 11
00
00
00
11
00
11
00
11
00
11
00
11
00
11
00 11
11
00
00
11
00
11
111
000
00
11
00
11
00
11
00
11
00
11
00
11
00 11
11
00
f

2.4

NPLUS

The following design rules must be adhered to for all n+ implant polygons:
Rule
a. Minimum width
b. Minimum inter-NPLUS spacing
c. Minimum overhang of DIFF layer
d. Minimum enclosure of CONTACT
e. Minimum area
f. NPLUS and PPLUS DIFF regions can be abutted if at
the same potential

Value
0.4
0.4
0.08
0.12
0.2916

2.5

PPLUS

See previous section, all rules are equivalent.

Rule code 4.17.

2.6

CONTACT

The following design rules must be adhered to for all contacts

Rule
a. Fixed size
b. Minimum enclosure of CONTACT
c. Minimum inter-CONTACT spacing
d. Minimum CONTACT on DIFF spacing to PO1
e. Minimum CONTACT on POLY spacing to DIFF edge
f. POLY CONTACT on DIFF is not allowed

c
a
a

Value
0.24 0.24m2
0.1
0.26
0.15
0.18

1111111111111111
0000000000000000
0000000000000000
1111111111111111
0000000000000000
1111111111111111
0000000000000000
1111111111111111
0000000000000000
1111111111111111
0000000000000000
1111111111111111
0000000000000000
1111111111111111
0000000000000000
1111111111111111
000000000
111111111
000000000
1111111111111
0000
000000000
111111111
000000000
111111111
000000000
111111111
1111
0000
000000000
111111111
000000000
111111111
b

Note: It is advisable to optimise your use of contacts to minimise contact resistance.

2.7

METAL1

The following design rules must be adhered to for all Metal 1.

Rule
a. Minimum
b. Minimum
c. Minimum
d. Minimum
e. Minimum

width
inter-METAL1 spacing
inter-METAL1 spacing for width 10 m
METAL1 enclosure of CONTACT
METAL1 area

111111
000000
000000
111111
000000
111111
000000
111111
000000
111111

b
a

Value
0.24
0.24
0.28
0.08
0.1764

1111111111111111
0000000000000000
0000000000000000
1111111111111111
0000000000000000
1111111111111111
0000000000000000
1111111111111111
0000000000000000
1111111111111111
0000000000000000
1111111111111111
0000000000000000
1111111111111111
0000000000000000
1111111111111111
d

*Note: Edge enclosure of CONTACT can be allowed to be zero in certain cases.

2.8

MVIAn (1-4)

The following design rules must be adhered to for all vias.

Rule
Value
a. Fixed size
0.28 0.28m2
b. Minimum inter-MVIA spacing
0.28
c. Minimum METALn enclosure of MVIA along metal line
0
d. Minimum METALn enclosure of MVIA with metal
0.2
width 10m
e. Minimum METALn enclsoure of MVIA at metal ends
0.08

1111111111111111
0000000000000000
0000000000000000
1111111111111111
0000000000000000
1111111111111111
0000000000000000
1111111111111111
0000000000000000
1111111111111111
0000000000000000
1111111111111111
1111111
0000000
0000000000000000
1111111111111111
111
000
0000000000000000
1111111111111111
c

2.9

METALn (2-5)

The following design rules must be adhered to for Metals 2 through to 5.

Rule
a. Minimum
b. Minimum
c. Minimum
d. Minimum
e. Minimum

width
inter-METALn spacing
inter-METALn spacing for width 10 m
METALn enclosure of VIAn-1
METALn area

111111
000000
000000
111111
000000
111111
000000
111111
000000
111111

b
a

Value
0.28
0.28
0.32
0.08
0.1936

1111111111111111
0000000000000000
0000000000000000
1111111111111111
0000000000000000
1111111111111111
0000000000000000
1111111111111111
0000000000000000
1111111111111111
0000000000000000
1111111111111111
0000000000000000
1111111111111111
0000000000000000
1111111111111111
d

*Note: Edge enclosure of VIA can be allowed to be zero in certain cases.