Escolar Documentos
Profissional Documentos
Cultura Documentos
Chips Inside
Int
od ction
Introduction
Integrated
g
circuits: manyy transistors on one chip
p
Very Large Scale Integration (VLSI): very many
Complementary Metal Oxide Semiconductor (CMOS)
CMOS transistors
Building logic gates from transistors
Transistor layout and fabrication
AT&T Archives.
Reprinted with
permission.
permission
Bi
th of Integ
ated Ci
c it
Birth
Integrated
Circuit
1958: First integrated circuit
G
th R
t
Growth
Rate
53% compound
p
annual growth
g
rate over 50 years
y
[Moore65]
Electronics Magazine
Ann
al Sales
Annual
>1019 transistors manufactured in 2008
MOS Integ
ated Ci
c its
Integrated
Circuits
1970s p
processes usuallyy had onlyy nMOS transistors
Intel
Museum.
[Vadasz69]
Reprinted
with
permission.
1969 IEEE.
1980
1980s-present:
t CMOS processes for
f low
l
idle
idl power
ECEN 454 Lecture 1
M
Moores
Law
L
F
t
Si
Feature
Size
Minimum feature size shrinking
g 30% everyy 2-3 yyears
10
Core i7
Quad core (& more)
Pentium-style architecture
2 MB L3$ / core
Characteristics
45-32 nm process
731M transistors
2.66-3.33+ GHz
Up to 130 W
32/64 bit word size
1366-pin
p LGA
Multithreading
On-die memory controller
11
Design Flo
Flow
Architecture: Users p
perspective,
p
, what does it do?
Microarchitecture
12
Design Cycles
C cles
System/Architectural
y
/
Design
g
HDL
Logic Design
Verification/Simulation
Physical Design/Layout
Parasitic Extraction
Fabrication
ECEN 454 Lecture 1
Testing
13
alucontrol
datapath
standard
cell library
bitslice
inv4x flop
alu
fulladder or2
zipper
ramslice
and2 mux4
mux2
tri
14
Y Cha t
Y-Chart
Structural
domain
Behavioral
domain
Processor
Algorithm
Register
Gate
Transistor
Boolean function
Mask
Cell placement
Module placement
Floorplan
Physical domain
15
Standard cell
FPGA/PLD
16
Silicon Lattice
Transistors are built on a silicon substrate
Silicon is a Group IV material
Forms crystal lattice with bonds to four neighbors
Si
Si
Si
Si
Si
Si
Si
Si
Si
17
Dopants
Silicon is a semiconductor
Pure silicon has no free carriers and conducts poorly
Adding dopants increases the conductivity
Group V: extra electron (n-type)
Group III: missing electron, called hole (p-type)
Si
Si
Si
Si
Si
Si
As
Si
Si
Si
Si
Si
Si
Si
Si
Si
Si
18
p
n JJunctions
nctions
p-n
A jjunction between p-type
p yp and n-type
yp semiconductor
forms a diode
Current flows only in one direction
p-type
n-type
anode
cathode
19
Gate
Drain
Polysilicon
SiO2
n+
n+
p
bulk Si
20
nMOS Ope
ation - OFF
Operation
Bodyy is commonlyy tied to g
ground (0
( V))
When the gate is at a low voltage:
Gate
Drain
Polysilicon
SiO2
0
n+
n+
S
p
bulk Si
21
nMOS Ope
ation - ON
Operation
When the g
gate is at a high
g voltage:
g
Gate
Drain
Polysilicon
SiO2
1
n+
n+
S
p
bulk Si
22
pMOS T
ansisto
Transistor
Similar,, but doping
p g and voltages
g reversed
Gate
Drain
Polysilicon
SiO2
p+
p+
n
bulk Si
23
Po
e S
ppl Voltage
Power
Supply
GND = 0 V
In 1980s, VDD = 5V
VDD has decreased in modern processes
VDD = 3.3,
3 3 2.5,
2 5 1.8,
1 8 1.5,
1 5 1.2,
1 2 1.0,
10
24
T
ansisto s as S
itches
Transistors
Switches
We can view MOS transistors as electricallyy controlled
switches
Voltage at gate controls path from source to drain
d
nMOS
pMOS
g=0
g=1
d
OFF
ON
OFF
ON
s
s
ECEN 454 Lecture 1
s
25
Signal St
ength
Strength
Strength
g of signal
g
26
Pass T
ansisto s
Transistors
Transistors can be used as switches
g
s
g
s
27
Pass T
ansisto s
Transistors
Transistors can be used as switches
g=0
g
s
Input g = 1 Output
0
strong 0
g=1
s
1
Input
g=0
g
s
g=1
d
d
g=0
g=1
s
degraded 1
degraded 0
g=0
Output
strong 1
28
T
ansmission Gates
Transmission
Pass transistors p
produce degraded
g
outputs
p
Transmission gates pass both 0 and 1 well
29
T
ansmission Gates
Transmission
Pass transistors p
produce degraded
g
outputs
p
Transmission gates pass both 0 and 1 well
Input
g
a
b
gb
b
gb
g = 0, gb = 1
a
b
g = 1, gb = 0
0
strong 0
g = 1,
1 gb = 0
a
b
g=1
1, gb = 0
strong 1
1
g
a
g
b
gb
Output
p
b
gb
30