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K.L. Choy / Progress in Materials Science 48 (2003) 57170

Table 10 (continued)
Variants of CVD

Special features

Distinctive advantages

Aerosol assisted CVD e.g.

Performs in an open atmosphere

for oxide deposition
Generates aerosol precursor using

Pyrosol
ESAVD/EAAJD

 Ultrasonic generator
 Electrostatic spraying or electrostatic
aerosol generator
 High deposition eciency

Fast evaporation of the precursor

and relatively a shorter delivery
time of the vapour precursor to the
reaction zone, and higher
deposition rate
 low cost
 thin or thick lms
 cost-eective

Chemical vapour
inltration

Involves the diusion and inltration Enables the densication of

porous ceramic preform with
of gaseous reactants through the porous
bre preform where the gaseous reactants little thermal, chemical or
mechanical damage to the
undergo decomposition and chemical
fragile reinforcing bres as
reaction to depositthe ceramic matrix
compared to the conventional
material on the surface of the bres in
densication and hot pressing
the preform
methods
A commercial method for the
manufacturing of ceramic matrix
material of ceramic bre reinforced
composites

A subsequent CVD of protective coatings is often required on the CVI fabricated

carboncarbon composites (see Section 12.1) in order to improve the oxidation and
thermo-mechanical properties of the composites, especially carboncarbon composites.

13. Comparison of various CVD methods

The conventional CVD process based on thermally activated CVD uses inorganic
precursor sources. The deposition process is initiated by thermal energy and occurs
at atmospheric pressure, low pressure or ultrahigh vacuum. The deposition often
requires relatively high temperatures (typically 5001400  C) depending on the type
of inorganic precursor (e.g. halides, hydrides, etc.) used. Other variants of CVD (e.g.
plasma enhanced CVD, photo-assisted CVD, atomic layer epitaxy, electrochemical
vapour deposition, metalorganic CVD, pulsed injection MOCVD) have been developed. In addition, emerging low cost, non vacuum CVD-based techniques (e.g.
aerosol assisted CVD and ame assisted CVD) have the potential to be scaled up for
large area or mass production. Most of these variants can also be performed at
atmospheric pressure or reduced pressure. However, plasma enhanced CVD needs
to be performed at low pressure (typically 1.31333 Pa) to generate the plasma.
Table 10 provides a summary of these dierent variants of CVD for the deposition
of lms, their special features which is dierent to the thermally activated CVD, and
their distinctive advantages which provide the motivation for their development.