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J. Electrochem. Soc., Vol. 136, No. 11, November 1989 9 The Electrochemical Society, Inc.
Conclusion
From these studies it appears that high-quality amorphous m o l y b d e n u m sulfide films can be prepared by
chemical vapor deposition. The density of films prepared
close to 200~ corresponds well to the density of bulk MoS3
prepared by classical techniques. As the temperature of
film preparation is increased, there is a rapid increase in
density, corresponding to a loss of sulfur, as expected. For
both the bulk and thin film MoS3, it seems impossible to be
certain of the exact stoichiometry. However, the density
and FTIR results support that the materials are the same.
The films can be readily deposited on various substrates,
including simple aluminum foil. The films are very flexible
and, even when deposited on A1 foil, the adherence is remarkably good. Un d e r our deposition conditions we obtain packing densities of approximately 60%. The films can
easily be prepared even in our small research reactor with
surface areas of several hundred square centimeters. The
growth rate has not been optimized, but the rates described in this work (1000/~Jmin) are sufficient for most
applications. If indeed one of the main problems of the application of MoS3 as a cathode material is the intrinsic resistivity of the material, this problem has been diminished
but not eliminated by thin film preparation. The careful
control of temperature has allowed us to minimize the resistivity of the films, and the m i n i m u m occurs when the
stoichiometry is close to MoS3. We are continuing our
work on thin films of MoS3 to obtain resistivities substantially lower than the lowest observed, of 90 k~-cm. It is our
feeling that the only possible method of lowering the
resistance is to heavily dope the material.
The thin film work has allowed us to rapidly analyze several materials electrochemically and to observe the intrinsic limits of MoSs without binders or additives. The electrochemical behavior of thin films prepared in the
temperature range of 200~176
closely parallels the results obtained for bulk MoS3; however, superior long-term
cycling behavior was demonstrated. Two-thirds of the
original cycling capacity was maintained after 100 deep
discharge cycles at a rate of 0.2 mA/cm 2, with almost all of
this loss occurring during the first 6 cycles. In addition, in-
Acknowledgments
We would like to thank A. M. Williams for the molybden u m analysis, and J. J. Auborn for many helpful discussions. This work was supported in part by the Strategic
Defense Initiative Organization and managed by the Office
of Naval Research.
Manuscript submitted Nov. 28, 1988; revised manuscript
received March 27, 1989.
Many papers (5-11) have also been published on electrocrystallization. From the standpoint of technological importance, the studies on polycrystalline substrate (7, 10, 11)
are noteworthy. Fisher observed that nitric acid had an inhibiting effect on the silver deposition (7, 10). Vereecken
and Winand (11) studied the effect of electrolyte composition, temperature, current density, and duration on morphology. They qualitatively summarized the nature of the
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d. Electrochem. Soc., Vol. 136, No. 11, November 1989 9 The Electrochemical Society, Inc.
d e p o s i t as a f u n c t i o n of b o t h t h e ratio of c u r r e n t d e n s i t y to
c o n c e n t r a t i o n of t h e b u l k e l e c t r o l y t e a n d t h e c o n c e n t r a t i o n of t h i o u r e a .
A n o t h e r w a y to i m p r o v e t h e q u a l i t y of d e p o s i t is to a p p l y
a p u l s e d e l e c t r o l y s i s t e c h n i q u e in w h i c h a v e r y h i g h current density can be instantaneously applied and a very
t h i n d i f f u s i o n l a y e r is f o r m e d n e a r t h e c a t h o d e surface.
T h e s e r e s u l t s s h o w t h a t t h e p h y s i c a l p r o p e r t i e s of electrod e p o s i t e d film c a n b e d r a s t i c a l l y i m p r o v e d .
T h e effects of p u l s e d c u r r e n t o n t h e p h y s i c a l p r o p e r t i e s
of e l e c t r o d e p o s i t s o f silver w e r e r e p o r t e d b y D i n i (12) a n d
P a v l o v i c et ak (13). T h e v a r i a t i o n s i n b o t h t h e m o r p h o l o g y
a n d c r y s t a l s t r u c t u r e of silver e l e c t r o d e p o s i t e d i n a silver
a m m o n i a c o m p l e x b a t h a n d silver c y a n i d e b a t h as a funct i o n of t h e p u l s e d c u r r e n t d e n s i t y a n d p u l s e - o n t i m e w e r e
e x a m i n e d b y F u k u m o t o et al. (14). M o r e o v e r , t h e effect of
t h e c a t h o d i c o v e r p o t e n t i a l o n t h e n u c l e a t i o n rate o f silver
in AgNO3 s o l u t i o n w a s s t u d i e d u s i n g t h e p o t e n t i o s t a t i c
double pulse method. The two-dimensional nucleation
m o d e l w a s a p p l i e d to t h i s p h e n o m e n a b y L a n et al. (15).
I n s p i t e of m u c h w o r k o n t h e e l e c t r o d e p o s i t i o n o f silver
as m e n t i o n e d a b o v e , t h e g r o w t h m e c h a n i s m of t h e p r e c i p i t a t e d p a r t i c l e o n t h e c a t h o d e s u r f a c e at r e l a t i v e l y h i g h
o v e r p o t e n t i a l is n o t well u n d e r s t o o d . T h i s is p a r t l y bec a u s e of o u r p o o r k n o w l e d g e o n t h e ionic m a s s t r a n s f e r
r a t e o f A g ions. T h e p r e v i o u s p a p e r (16) d e a l t w i t h t h e
i o n i c m a s s t r a n s f e r of Ag i o n s a s s o c i a t e d w i t h n a t u r a l
c o n v e c t i o n a l o n g a v e r t i c a l silver c a t h o d e u n d e r d i r e c t curr e n t electrolysis. I n t h e p r e s e n t p a p e r , t h e m o r p h o l o g i c a l
v a r i a t i o n s o f silver w i t h c u r r e n t d e n s i t y a n d c h a r g e d e n sity will b e r e p o r t e d . T h e effect of t h e p u l s e s c h e d u l e o n
m o r p h o l o g i c a l v a r i a t i o n s a n d i o n i c m a s s t r a n s f e r r a t e s will
be examined by comparing the results obtained in direct
c u r r e n t electrolysis.
Experimental
T h e e l e c t r o l y t i c cell w a s m a d e of acrylic r e s i n plates. T h e
i n n e r d i m e n s i o n w a s 30 m m h i g h , 30 m m w i d e , a n d 10 m m
t h i c k . T w o e l e c t r o d e s 30 m m h i g h , 10 m m wide, a n d
0.5 m m t h i c k w e r e p r e p a r e d f r o m a rolled silver plate. A
p o l i s h e d c a t h o d e w a s e t c h e d in 30% HNO3 s o l u t i o n for a
few seconds. The electrodes were coated with PVC, except
for t h e p a r t b e t w e e n 5-15 m m f r o m t h e l o w e r e d g e of t h e
e l e c t r o d e s so t h e effective s u r f a c e area w a s 10 10 m m .
The electrodeposition was carried out under galvanostatic
conditions.
A c a t h o d e of 1 m m w i d t h w a s e m p l o y e d w h e n t h e conc e n t r a t i o n profiles of A g + i o n s f o r m e d n e a r t h e c a t h o d e
were measured by the holographic interferometry techn i q u e . T h i s w a s n e c e s s a r y to r e d u c e t h e o p t i c a l p a t h
l e n g t h u n d e r v e r y h i g h c u r r e n t d e n s i t y i n o r d e r to m e a s u r e
t h e r e f r a c t i v e i n d e x profile v e r y close to t h e c a t h o d e surface. T h e e l e c t r o l y t i c cell for t h e s e m e a s u r e m e n t s was
m a d e of P y r e x glass p l a t e s of 3 m m t h i c k n e s s w i t h i n n e r
d i m e n s i o n s o f 40 m m h i g h , 25 m m wide, a n d 1 m m thick.
T h e e f f e c t i v e s u r f a c e area of t h e c a t h o d e i n s t a l l e d i n t h i s
e l e c t r o l y t i c cell w a s 1 10 m m .
T h e c o m p o s i t i o n s of e l e c t r o l y t e s are s h o w n in T a b l e I.
The electrodeposition with pulsed current was mainly
c o n d u c t e d i n 0.5M AgNO3-0.5M HNO3 solution, b e c a u s e
u n i f o r m i t y of c u r r e n t d e n s i t y d i s t r i b u t i o n w a s o b t a i n e d
e v e n at t h e h i g h e r c u r r e n t d e n s i t y . H o w e v e r , t h e i o n i c
m a s s t r a n s f e r r a t e s w e r e s t u d i e d o n l y i n 0.5M AgNO3 solution, b e c a u s e o p t i c a l a n d p h y s i c a l p r o p e r t i e s o n AgNO3HNO3 s o l u t i o n are n o t k n o w n .
3279
DI = 1.4 x 10 ~(cm2/s)
a = 130.5 (cm3/mol)
u = 0.965 x 10-2 (cm2/s)
*t, = 0.482 (-)
D~ = 1.7 x 10 5(cm2/s)(ll)
a(~-r - ~/a2~2)= 88.9 (cm3/mol)
v = 1 x 10-2 (cm2/s)
*t, = 0
(-)
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J. Electrochem. Soc., Vol. 136, No. 11, N o v e m b e r 1989 9 The Electrochemical Society, Inc.
3280
duces the particle size by 20-30%. A c c o r d i n g to the polarization curves (16), the overpotential in 0.5M AgNO3 - 0.5M
HNO3 is t w i c e as large as that in 0.5M AgNO3 solution at
the s a m e current density b e l o w 100 m A / c m 2. This h i g h e r
o v e r p o t e n t i a l i n d u c e s a finer size of precipitated particles.
No net p r o d u c t i o n of precipitated particles d u r i n g elect r o d e p o s i t i o n was n o t i c e d in Fig. 1 and 2. If the n u m b e r of
precipitated particles on the c a t h o d e is substantially constant, the average d i a m e t e r of the precipitated particle
should be proportional to the c u b e root of the charge density. The d e p e n d e n c e of the average particle d i a m e t e r on
the charge density is s h o w n in Fig. 4. The a s s u m p t i o n of no
net p r o d u c t i o n of precipitated particles during e]ectrodeposition appears to be valid as long as the charge density is
less t h a n 9 C/cm 2, since linearity b e t w e e n the average particle d i a m e t e r and the c u b e root of the d u r a t i o n of electrolysis (charge density) is o b s e r v e d in both electrolytes u n d e r
t h e p r e s e n t e x p e r i m e n t a l conditions.
40
30
C/cm2
-t
5 s h o w s the m o r p h o l o g y o b t a i n e d u n d e r p u l s e d c u r r e n t in
0.5M AgNO3-0.5M H N Q solution. The charge density and
the pulse-on t i m e w e r e m a i n t a i n e d at 9 C/cm 2 and i ms, respectively. As m e n t i o n e d previously, the d i a m e t e r of elect r o d e p o s i t is d e c r e a s e d to a b o u t 10 ~m at 60 m A / c m 2 w i t h
increase in current density, and a needle-like electrodeposit is f o r m e d at 100 m A / c m 2 w h e n silver is e l e c t r o d e p o s i t e d
u n d e r direct current. H o w e v e r , pulsed electrolysis has
c o n s i d e r a b l y i m p r o v e d the quality of e l e c t r o d e p o s i t i o n
e v e n at a d u t y cycle of 0.5. The particle size is r e d u c e d
a b o v e an average current d e n s i t y of 30 m A / c m 2, and no form a t i o n of needle-like electrodeposit is o b s e r v e d at
100 m A / c m 2. F u r t h e r r e d u c t i o n in d u t y cycle i n t r o d u c e s
m u c h finer precipitated particles u n i f o r m l y distributed on
t h e cathode surface for cases a b o v e 30 m A / c m 2. H o w e v e r ,
at a d u t y cycle of 0.005, s o m e larger particles with 15 ~m
d i a m are precipitated u n d e r an average current density of
30-60 m A / c m 2.
The m o r p h o l o g y of e l e c t r o d e p o s i t e d particles b e c o m e s
v e r y c o m p l i c a t e d at a l o w e r average current d e n s i t y of
3 m A / c m 2. Moreover, a regular w a v y pattern w h o s e w i d t h
is a b o u t 100trm appears on the cathode surface at
r = 0.005. This is p r o b a b l y due to e l e c t r o d e p o s i t i o n of precipitates along a scratch m a r k on the cathode. This phen o m e n a was not r e p r o d u c i b l e and a structure r e s e m b l i n g a
b a m b o o grass leaf of 70 ~m d i a m and less t h a n 1 ~m in
t h i c k n e s s was s o m e t i m e s observed. S i n c e the m o r p h o l o g y
at 3 m A / c m 2 is not reproducible, these results will be
omitted.
T h e relationship b e t w e e n the average d i a m e t e r and t h e
p u l s e current density is s h o w n in Fig. 6. The data measu r e d u n d e r direct current is i n c l u d e d in the s a m e figure to
d e m o n s t r a t e that t h e l o g a r i t h m of the average d i a m e t e r decreases linearly with increase in the l o g a r i t h m of the direct
c u r r e n t d e n s i t y o v e r 10 m A / c m 2. When p u l s e plating is carried out at an average current density of 3 m A / c m 2, no substantial d e p e n d e n c e in the average d i a m e t e r on the pulse
50
20
o 0.5~
~0
AgNO~
~ 3o
10
2O
10
0
30
60
90
i (mAIcm 2 )
120
t113(s,3)
10
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J. Electrochem. Soc., Vol. 136, No. 11, November 1989 9 The Electrochemical Society, Inc.
,o
3281
'It
30
60
iav (mA/crn2 )
0.8
0.6
C~
o4
0-2
90
120
Fig. 7. Effect of average current density on dp/dDc (0.5M AgNO30.5M HNO3, To, = 1 ms, q = 9 C/cm2).
[1]
1.5
'
x~
'
~'(3~0~)
o(3,0.02)
O.5M A g N O 3 - 0 5 M H N O ~
TON=1ms
9 Clcm 2
::L
v 1.0
r'(--)
key
0.5
13
0.5
01
0.02
0,005
--X--
'
DC
'
'
;.
log ip (mAlcrn 2)
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J. Electrochem. Soc., Vol. 136, No. 11, N o v e m b e r 1989 9 The Electrochemical Society, Inc.
3282
C*
to t h e s u r f a c e c o n c e n t r a t i o n b u t to a v a l u e close to t h e
b o u n d a r y v a l u e b e t w e e n t h e oscillating layer a n d t h e virtually s t e a d y layer i n v o l v e d in t h e d u p l e x d i f f u s i o n layer
m o d e l , as d e m o n s t r a t e d in Fig. 9.
F o r p u l s e p l a t i n g w i t h a s m a l l e r d u t y cycle r, Ibl (18) prop o s e d t h e f o l l o w i n g r e l a t i o n s h i p b a s e d o n a s i m p l e diffusion model
c;
5p = ~/2DTon (1 - r)
9 s.
Cothode
-'k.-.=
ipr
C'o= Co - ~ ( ~ N C$
[3]
[4]
8p)
7 -- ~ ( z F ) 2 ( C ' e ) 2 D
[5]
4(ip) 2
[2]
I f t h e r e is n o e s s e n t i a l c h a n g e in t h e effective s u r f a c e area,
t h e c a l c u l a t e d l i m i t i n g c u r r e n t d e n s i t y for t h e p r e s e n t situa t i o n is 115 m A / c m 2. T h e solid line r e p r e s e n t i n g Eq. [1] is
e x t r a p o l a t e d to t h i s l i m i t i n g c u r r e n t d e n s i t y b y t h e d o t t e d
line as t h e r e is n o c o r r e l a t i o n e q u a t i o n at s u c h h i g h c u r r e n t
density.
T h e s u r f a c e c o n c e n t r a t i o n d u r i n g p u l s e p l a t i n g w a s estim a t e d . T h e o b s e r v e d s u r f a c e c o n c e n t r a t i o n s at t h e e n d o f
t h e p u l s e - o n t i m e o f l s are l o c a t e d on t h e solid line. T h e
s u r f a c e c o n c e n t r a t i o n at t h e e n d o f t h e p u l s e - o n t i m e o f l s
at a d u t y cycle o f 0.5 can b e a p p r o x i m a t e d b y t h e v a l u e pred i c t e d u n d e r a d i r e c t c u r r e n t d e n s i t y e q u i v a l e n t to t h e
s a m e a v e r a g e c u r r e n t d e n s i t y , as l o n g as t h e d r i v i n g force
o f n a t u r a l c o n v e c t i o n is small. H o w e v e r , t h e s u r f a c e conc e n t r a t i o n s u n d e r a p u l s e - o n t i m e o f 1 m s a n d at s m a l l e r
d u t y cycle are l o c a t e d a b o v e t h e line, e s p e c i a l l y at h i g h e r
a v e r a g e c u r r e n t d e n s i t y . U n d e r s u c h a p u l s e s c h e d u l e , it is
c o n s i d e r e d t h a t t h e t h i c k n e s s o f t h e oscillating layer is
a b o u t 2 I~m, w h i c h is less t h a n t h e p r e s e n t r e s o l u t i o n
p o w e r o f at m o s t 5-10 p.m b a s e d o n d i f f r a c t i o n t h e o r y (19).
It is t h e r e f o r e c o n c l u d e d t h a t t h e m e a s u r e d c o n c e n t r a t i o n
o f A g ion u n d e r t h e p u l s e s c h e d u l e o f s h o r t e r p u l s e - o n
time and higher pulse current density does not correspond
key
O.S
0.4
Ton
ra
0.5 l s
0.5
ip
r
(A/cm2) (-)
ls
ls
ls
1 ms
1ms
1 ms
1ms
l ms
0.5
0.5
0.5
0.5
0.02
0.02
0.05
0.05
0.003
0.03
0.06
0.03
0.003
0.03
0.06
0.1
~N
(cm)
5p
(cm)
Ce~
(M)
Cte
(M)
(M)
0.470
0.338
0.223
0.338
0.475
0.355
0.278
0.117
---0.344
0.475
0.346
0.233
0.101
0.475
0.344
0.229
0.344
0.475
0.344
0.229
0.06a
el s
aCl~ was taken from Fig. 1O. Except for this value, C1~was calculated from Eq. [1].
1 ms
0.05 1ms
0
"6
E 0.3
0.02 1 ms
-
ip
0.2
(~1
0.006
0.06
0.12
0.06
0.15
1.5
1.2
2.0
Lay
(A]cm2)
~- ~. ", %. % , - . ~
o ~ ,,,
% -.\
t
30
F
60
t
90
\
120
Jay (mA/cm 2)
Fig. 10. Effect of average current density on surface concentration of
Ag + ions (0.5M AgNO3).
(A/cm 2)
(~)
iav
(A/cm2)
8N
(cm)
:~
( )
C'e
(M)
C]s
(M)
0.06
0.12
0.2
0.03
0.3
0.6
1
0.15
1.5
3
5
6
12
20
0.5
0.5
0.5
0.1
0.1
0.1
0.1
0.02
0.02
0.02
0.02
0.005
0.005
0.005
0.03
0.06
0.1
0.003
0.03
0.06
0.1
0.003
0.03
0.06
0.1
0.03
0.06
0.1
0.0140
0.0122
0.0110
0.0223
0.0140
0.0122
0.0110
0.0223
0.0140
0.0122
0.0110
0.0140
0.0122
0.0110
0.0001
0.0001
0.0001
0.0002
0.0002
0.0002
0.0002
0.0002
0.0002
0.0002
0.0002
0.0002
0.0002
0.0002
0.246
0.057
-0.460
0.248
0.061
0.243
0.053
-0.459
0.243
0.053
(ms)
2 x 103
28.1
0
3 10a
85
1.3
0
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J. Electrochem. Soc., Vol. 136, No. 11, November 1989 9 The Electrochemical Society, Inc.
short, so the difference between C'~ and the surface concentration predicted by Eq. [1] at an average current density is minor. However, the calculated transition time, ~, is
less than the pulse-on time of 1 ms for many cases.
Thus, the critical condition under which the transition
time is reduced to be less than the pulse-on time of 1 ms is
demonstrated by a dotted line in Fig. 7. Above this dotted
line corresponding to the limiting current pulse characterized by T = ~, the pulse plating technique can be adequately applied to produce finer precipitates, while less
substantial i m p r o v e m e n t due to pulse plating is expected
below it. This dotted line crosses near the m i n i m u m point
of each curve at a particular duty cycle, except for
r = 0.005. Therefore, it will provide a good basis for the determination of the o p ti m u m scheduling of pulse plating.
Summary
Ag ~ ions were electrodeposited on a plane vertical silver
cathode installed in 0.5M AgNO3 and 0.5M AgNOa-0.5M
HNO3 solutions under direct and pulsed current. It was
found, through the experiments under direct current, that
Ag ions were preferentially electrodeposited on the surface of particles that had initially precipitated onto the
cathode and that the particle diameter was proportional to
the cube root of the charge density and decreased with increase in current density. The addition of HNO3 induced a
higher polarization and made a spheroidal shape of the
precipitated particle.
Pulse plating was conducted mainly in 0.5M AgNO30.5M H N Q solution and the average diameter was measured. Comparing this data with data obtained under direct
current showed that the effect of pulsed current on the
ratio of the diameters obtained by both processes was
most significant near the average current density of
50-60 mA/cm 2. Moreover, this effect was enhanced with reduction of the duty cycle, that is, with corresponding increase in pulse current density.
By measuring the surface concentration o f A g ions with
holographic interferometry, the qualitative soundness of
the duplex diffusion layer model proposed by Ibl was no*
ticed. Based on the duplex diffusion model, the transition
time at which the surface concentration of Ag ions is depleted to zero at the end of the pulse-on time was evaluated. This concept of limiting current pulse was reasonably compared with the experimental observation on the
ratio of precipitated particle diameter under pulsed current to that under direct current. The soundness of the
present way of estimating the limiting current pulse must
be further examined in many other metals and alloys in
order to provide a reasonable method to provide o p t i m u m
scheduling on pulse plating.
Acknowledgment
Part of this work was performed under financial aid
given to Y. F. by The Institute of Space and Astronautical
Science, to which the authors are grateful.
Manuscript submitted Nov. 28, 1988; revised manuscript
received April 21, 1989.
C*
CS
D1
d
iav
ip
q
LIST OF SYMBOLS
concentration in the bulk solution (mol/cm 3)
surface concentration of Ag ions (mol/cm 3)
diffusivity of Ag ion (cm2/s)
particle diameter (cm)
average current density (A/cm 2)
pulsed current density (A/cm 2)
amount of electricity (C/cm 2)
3283
Ra~
Rayleigh n u m b e r = gax301(-)
vD1
Ra*=
modified Rayleigh n u m b e r -
duty cycle ( - )
Sh=
Sherwood n u m b e r -
Ton
t
*t,
x
~N
~p
01
concentration difference between the cathode surface and bulk electrolyte (mol/cm 3)
kinematic viscosity (cm2/s)
transition time (s)
density of bulk electrolyte (g/cm 3)
density of electrolyte at the cathode surface (g/cm 3)
v
p*
pS
gaiav(1 - *t,)x 4
zlFvD12
(-)
*h)x
(-)
zlFDl~l
ia~(1
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