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1(a) Explain the process flow of the starting material to pure silicon wafer.
Draw the necessary diagrams. Write the reactions that take place in the process
flow.
OR
(University
of Jammu) (4)
Q. No. 2(a) Define epitaxy. What are its types? How epitaxy is different from
crystal growth? List the applications and advantages of epitaxy.
(8)
Q No. 6 What do you understand by dry oxidation and wet oxidation? With
the help of neat schematic explain the process of the oxide growth.
(10)
Q. No. 7 Discuss the following processes:
(a) Oxidation
(b) Etching
(c) Lithography
(d) Ion Implantation
(University
of Jammu) ( 4
5 )
(University
of Jammu) (10)
Q. No.9 what are the various processes of CMOS fabrication? Illustrate the
main steps in a typical n well process.
(University
of Jammu) (20)
Q.No 10 Give the device structure for CMMOS inverter and explain the
same.
(University
of Jammu) (20)
Q. No.11 Explain the LOCOS technique. Illustrate the basic steps of the
LOCOS process with neat diagram.
(University
of Jammu) ( 20
)
Q. No. 12 Explain the fabrication steps involved in patterning silicon dioxide
through optical lithography.
(University
of Jammu) (10)
Q.No 16 What is doping? Compare and contrast epitaxy, diffusion and ion-
implantation as impurity doping processes.
(University of
Jammu) ( 20 )
Q. No. 17 Discuss CMOS fabrication using:
(a) N-Well process