Escolar Documentos
Profissional Documentos
Cultura Documentos
Kanazawa University
Microelectronics Research Lab.
Akio Kitagawa
Well structures
n-well n-well process
p substrate
3
Shallow trench isolation (STI)
Field Active Field Active Field
isolation MOSFET isolation MOSFET isolation
4
Layout and cross section (Twin
well)
poly (G) poly (G)
contact S D Contact S D
B
Wn Wp
B
p-active n-active
n-active p-active n-well
Ln Lp
B S G D contact B S G D
D D
Field Oxide
FOX p+ n+ n+ FOX n+ p+ p+ FOX
n-well
p-substrate
n-ch MOSFET p-ch MOSFET
5
Layout and cross section (Triple well)
B
Wn Wp
B
p-active contact
1
Metal-1
poly-1 2 2
2 2
2
2
2
1
2 2
1
1
Via-1
2
9
Example of design rules (2)
Minimum Density Rules Antenna Rules
(Process-Induced Damage Rules)
Fine featured processes utilize The "Antenna Rules" deal with process
CMP (Chemical-Mechanical induced gate oxide damage caused when
Polishing) to achieve planarity. exposed poly-silicon and metal structures,
Effective CMP requires that the connected to a thin oxide transistor, collect
variations in feature density on charge from the processing environment (e.g.,
a layer be restricted. reactive ion etch) and develop potentials
sufficiently large to cause Fowler Nordheim
SF(poly) current to flow through the thin oxide. The
rules require that the area of the polysilicon
SF(M1) and metal over field oxide divided by the area
of the transistor gate (thin oxide area) must be
less than Np (where Np is a limit that depends
on the process and on design targets).
SG 10
Verifications of the layout design
DRC (Design Rule Check)
Detection of the design rule violation
ERC (Electrical Rule Check)
Detection of the open/short error
LVS (Layout VS Schematic)
Equivalence checking between layout and
schematic
The layout design checker has a batch processing mode and
interactive mode.
11
Influence on circuit performance of
the layout
Frequency response in high-frequency region
The parasitic resistance and the parasitic capacitance raise an
unintended pole and zero.
The long interconnect acts as a parasitic inductor or LC resonator.
Precision of the circuit operation
Common centroid layout of MOSFET, C, and R can improve the
production tolerance and mismatch.
Symmetric layout of interconnect can improves the production
tolerance and skew of the digital signal (delay) and analog signal
(phase lag).
Noise and jitter characteristics
The parasitic resistance, especially poly-Si, act as a thermal noise
source.
The parallel placement of interconnect raise a crosstalk of signals. 12
(1) Layout of the MOSFET
13
Layout sample of MOSFET
n-well
n-ch p-ch n-active (n+)
p-active (p+)
poly
contact
G G metal-1
via-1
metal-2
S D D S
B B
14
Parasitic of MOSFET
Parasitic Drain junction
D capacitance
Long W
LD D
C j W LD
L G G B
W
LS S RG R C j W LS
L CgsWL
B
Gate resistance
(R: sheet S
resistance) Gate-Source capacitance
Long W: large time constant of gate poly-Si
Long W: large thermal noise of gate poly-Si
Long LD, LS: large parasitic capacitance and resistance of drain/source area
Few number of contact: Shift or fluctuation of substrate potential
How can you design the MOSFET with larger W? 15
Fingered MOSFET
MOFET should be W/4
sectioned to reduce High-performance MOSFET array
the gate resistance.
W 1
R
L gm
Finger
gm: trans-conductance
Abutment
dI ds
g m y21 G S
dVgs
D
This condition is
often met in the case
of W/L < 20.
W/L < 10 is B
recommended.
Multiply = 4 (W/4 4) 16
Reduction of the drain junction
capacitance (single MOSFET)
S
D Abutment
G LD D
LD S
W S
W/2
W
C DB C jWLD > C DB C j LD
2
Cj = Capacitance of drain bottom pn junction per area (F/m2)
17
Reduction of the drain junction
capacitance (series MOSFET)
D
LD Abutment
D
S
SLGmin D/S
LD D
S
S W
W
C p 2C jWLD > C p C jWSLG min
Cj = Capacitance of drain bottom pn junction per area (F/m2)
SLGmin = minimum gate spacing
18
Dummy gate
The dummy pattern may be formed to reduce the production tolerance.
G
B
D
S
20
IN1 IN2 OUT
VDD
poly-1 n-well
n+ Metal-1
p+ Metal-2
Contact Via-1
VSS 21
Matching layout
Matching layout is used to enhances the relative
precision of device pair (e.g. a differential pair, a
current mirror). (around 1%)
Use of The repeat of warp of the fundamental unit
The devices of the different shape and direction match very
poorly.
Use of the dummy pattern
Use of the common centroid pattern
Trimming is necessary if you expect more precise
matching.(less than 0.1%)
22
Distribution of GOX thickness
Flux of O2
G G
GOX GOX
Temperature and flow
n+ n+ FOX n+ n+ FOX
distribution in the oxidation S D S D
furnace
A B B A A B A B B A A B B A
4 segments B A B A A B B A A B
4 segments 8 segments A B B A
B A A B
16 segments24
Segmentation and Placement for
common centroid layout
W/2
MOSFET A
W
Dummy Dummy
D D
GA GB
Matched
devices S S
GB GA
MOSFET B
D D
Dummy Dummy
25
Distribution of device parameter
Layout sample of a differential pair
VSS D2 D1 D2 VSS
Dummy Dummy
G2 S12 G1 S12 G2
poly-1 D1 D2
Metal-1
n+ Metal-2
G1 G2
p+ Via-1
Contact VSS S12 26
(2) Layout of the passive devices
27
Example of the characteristics of
the passive device
Component Values Mismatch Temp. Volt.
Coefficient Coefficient
MOS Cap. 2.2 2.7 0.05% 50 ppm/ 50 ppm/V
fF/m2
Poly2/Poly1 0.8 1.0 fF/ 0.05% 50 ppm/ 50 ppm/V
Cap. m2
p+ Resister 80 150 / 0.4% 1500 ppm/ 200 ppm/V
p+ diff. Resistor 50 80 / 0.4% 1500 ppm/ 200 ppm/V
Poly Resistor 20 40 / 0.4% 1500 ppm/ 100 ppm/V
N-well Resister 1 k 2k / 1% 8000 ppm/ 10k ppm/V
The mismatch error on a chip is very small.
28
Structure of MIM capacitor
Poly Capacitor (Before 0.25m CMOS process)
MIM Capacitor (After 0.18m CMOS process)
VDD VDD
(Shield) (Shield) Metal-x+1
Capacitor Metal
Poly-2
Poly-1
Metal-x
N+ N+
FOX(SiO2 FOX(SiO2
N-well N-well
P-substrate P-substrate
Poly Capacitor MIM Capacitor
29
Layout sample of a MIM capacitor
Metal-5 Metal-4
CMIM Dummy CM
Cp
Metal-4
Capacitor Metal (CM)
Metal-5 MIM Capacitor with the dummy CM
VIA4
Dummy (The dummy metal is automatically inserted, if the dummy is not
specify. The dummy metal may work as a parasitic capacitance.) 30
Structure of spiral inductor
Metal-4 CP
Top metal
Metal-1 CF
L RS
CF
Substrate
Cross section
31
Structure of the resistance
Active Active Active
M1
Protect M1
VDD
(Shield) P+ FOX N+ FOX
N+ N-well N-well
Silicide
P-substrate P-substrate
N+ FOX
N-well
P-substrate
poly resistor 32
Layout sample of a poly resistor
L
R RS (recommended L/W > 5)
W
RS : SheetResistance
L
Protect (non-silicide area)
p-select, n-select or high-resistance 33
Common centroid layout of a
resistor pair
R Dummy
R
R2
R2
Dummy
Metal-1 p+ diffusion
34
(3) Shielding and guard ring
35
Type of noise
Inherent noise
Noise resulting from the discrete and random movement of charge
in a device
Thermal noise, Flicker noise, shot noise
The noise floor depends on the circuit design quality
Quantization noise
Noise resulting from the finite digital word size
The SNR (signal-to-noise ratio) depends on the accuracy of ADC
and DAC.
Coupled noise (Crosstalk)
Noise resulting from the signals adjacent circuits deeding into each
other
The noise immunity depends on a layout.
36
Type of coupled noise
37
Capacitive coupling
Analog circuit
Vdig
Digital signal
Cc
Vanalog
Analog signal Vsig Rout Cs
Analog circuit
1 Vsig
SNR
j Cc Rout Vdig
38
Shielding of interconnects
Shielding plate Shielding line
Signal
W Analog circuit Digital circuit
Digital line
3W p-substrate p-substrate
GND
Analog line
analog VSS
39
Shielding of substrate
FOX FOX
n+ n+
Shield Shield
Noise
(charge and discharge) n-well
p-substrate
Cross section
40
(absorption of
(termination of
Guard ring minority carrier)
n-guard ring
electric field)
p-guard ring
Digital circuit
Analog circuit (noise source)
p-substrate
analog VSS
I2(t)
I1(t)
Digital signal current I1(t)
Current
42
Translational symmetric layout
(In-phase circuit)
magnetic flux magnetic flux
Analog circuit Analog circuit
VDD
Adjacent placement
Analog Circuit VSS
44
Bypass capacitors on VDD, VSS
lines
p-substrateVSS
VDD
46
Input Pad with ESD protection
The ESD protection is required to prevent the damage of the GOX of
a MOSFET from the static charge buildup.
Input VDD
Pad FOX FOX
CMOS p+ n+
Circuit n-well
VSS p-substrate
NOTE: If the inductive load is used the output, the amplitude of the output
signal is larger than power supply voltage. In this case, the ESD protection
diode must be connected tandemly. 47
Layout sample of pad ESD protection
Pad
Layer
n-well
n-active (n+)
p-active (p+)
poly-1
contact
metal-1
via-1
metal-2
VDD
VSS
Input 48