Escolar Documentos
Profissional Documentos
Cultura Documentos
Renewable Energy
journal homepage: www.elsevier.com/locate/renene
Review
a r t i c l e i n f o a b s t r a c t
Article history: The multilevel impurity photovoltaic effect (IPV) of the sulfur doped crystalline silicon (c-Si) is studied by
Received 1 May 2014 using the SCAPS program. The effects of impurity concentration (Nt) of two and four defect levels on the
Accepted 19 December 2014 performance of sulfur doping c-Si solar cell are investigated, respectively. Then, the quantum efficiencies
Available online
(QE) of different cases (without impurity, two and four defect levels) are considered. The results show
that after the doping of sulfur, the infrared response of the c-Si solar cell is enhanced. Moreover, the
Keywords:
infrared response wavelength range of the case considering two defect levels may be wider than that of
Silicon solar cell
four defect levels. In order to get the highest photovoltaic conversion efficiency (PCE), the number and
Multilevel IPV effect
SCAPS simulator
the type of defect levels should be controlled. In the end, with four defect levels considered, the thickness
and background doping concentration (ND for the n-type layer and Na for the p-type layer) of each layer
of the nþepepþ structure are optimized. Our results suggest that higher PCE could be achieved than that
without impurity by choosing a suitable doping concentration. The efficiency of 25.32% attained in the
four-defect case improved the PCE by 2% more than the value of 23.22% without sulfur doping.
© 2014 Elsevier Ltd. All rights reserved.
http://dx.doi.org/10.1016/j.renene.2014.12.049
0960-1481/© 2014 Elsevier Ltd. All rights reserved.
E.T. Hu et al. / Renewable Energy 77 (2015) 442e446 443
in Type-I are the same and so are Type-II. Moreover, both of Type-I In Eq. (1) tn0 andtp0 are SRH lifetimes for electron and hole con-
and Type-II are double donors [10]. The IPV effect in silicon solar centrations after illumination while gnt and gpt represent the optical
cell doped with sulfur was studied previously [7]. By numerical emission rates from the defect for electrons and holes, respectively,
simulation, it was found that when Ec Et ¼ 0.18 eV and Nt z Na for which constitute the IPV effect of the modified SRH model. These
opt opt
fixed Et, the PCE was the highest. However, only one defect level processes are indicated as Ee and He as it is shown in Fig. 1(a).
was considered in each simulation in Ref. [7]. Moreover, due to the They are given by
nature of double donors of Type-I and Type-II impurity centers, the
three defect levels considered in Ref. [7] will not appear simulta- 1 1 1 1
tn0 ¼ ¼ ; tp0 ¼ ¼ (3)
neously in c-Si doped with sulfur. Suppose that there is an infinite cn Nt sn nth Nt cp Nt sp nth Nt
number of defects, the limiting efficiency of solar cells with IPV
could reach 77.2% under blackbody illumination [11]. Therefore, it is lZnmax
meaningful to investigate whether the efficiency can be improved
gnt ¼ Nt sopt
n x; l fph x; l dl (4)
when more than one defect level is introduced in a c-Si solar cell,
doped with sulfur. lnmin
lZnmax
2. Model description opt
gpt ¼ Nt sp x; l fph x; l dl (5)
lnmin
In the present work, multiple defect levels are considered. The
SCAPS program [12,13] is used to study the nþepepþ structure of c-
where sn and sp represent the electron and hole capture cross
Si solar cell doped with sulfur. First, the relations between Nt and
sections, respectively. vth is the carrier thermal velocity, and Nt is
PCE with different number of defect levels are studied. Then, all of
impurity concentration. soptn andsp
opt
are electron and hole photo-
the defect centers except Type-III are considered and the thickness
and background doping concentration of each layer is optimized. emission cross sections of the impurity while fph(x,l) is the photon
The detail of using SCAPS to deal with the IPV effect can be found in flux density at depth x from the illuminated surface for wavelength
Ref. [14]. l. In Eqs. (4) and (5), fphx, l can be expressed as
The SRH recombination model was modified in order to model
the IPV effects which include the photo-generation effect through 1 þ Rb e4atot ðlÞðLxÞ 2atot ðlÞx
fph ðx; lÞ ¼ fext ðlÞ e (6)
defect level [1,6e8]. As illustrated in Fig. 1(a), an electron is excited 1 Rb Rf e4atot ðlÞL
from VB to the defect level by a sub-band gap photon, and then
another photon is needed to excite the electron to CB. Electrons and where fext(l) is the external incident photon flux and Rf and Rb
holes' transition through the defect levels is governed by capture, represent the internal reflectance at the front and rear surfaces
thermal and optical emission of carriers. which are used to describe the light trapping effect. atot(l) is the
For a steady-state condition, the net recombination rate U via an total absorption coefficient which is given by
impurity level is expressed as [1]:
atot ðlÞ ¼ an ðlÞ þ ap ðlÞ þ afc ðlÞ þ aeh ðlÞ (7)
np ðn1 þ tn0 gnt Þ p1 þ tp0 gpt
U¼ (1) where an(l) and ap(l) are the defect absorption coefficients, and
tn0 p þ p1 þ tp0 gpt þ tp0 ðn þ n1 þ tn0 gnt Þ afc(l) is the absorption coefficient of free carriers while aeh(l)
represents the band to band absorption coefficient. A detailed
where n and p are electron and hole concentrations, respectively, approach of this model could be found in Ref. [14].
and n1 and p1 are electron and hole concentrations after impurity The nþ-p-pþ structure as shown in Fig. 1(b) is used in the present
doping when the electron and hole Fermi energy levels EFn, EFp calculation with the initial thickness of each layer 0.3 mm, 50 mm
coincide with the impurity level Et which is given by and 1 mm, respectively. nþ is the emitter layer with ND ¼ 1018 cm3
while 1017 cm3 and 1018 cm3 are the Na of the p base layer and pþ
n1 ¼ Nc eðEc Et Þ=kT ; p1 ¼ Nv eðEt Ev Þ=kT (2) layer, respectively. The pþ layer not only serves as a back surface
field (BSF) layer, but also keeps a high value for the built-in-voltage
where Et is the impurity energy level. Ec and Ev are CB and VB edges and the impurity level occupied [2]. The p base layer is doped with
and Nc and Nv are the effective densities of states in the CB and VB. sulfur.
Fig. 1. (a) Illustration of transitions in IPV solar cell. (b) Schematic diagram of the silicon solar cell.
444 E.T. Hu et al. / Renewable Energy 77 (2015) 442e446
Table 1
The parameters of the impurity centers used in the calculation.
Fig. 2. Dependence of (a) PCE, (b) short circuit current density Jsc, (c) open circuit voltage Voc and (d) Fill factor on concentration of sulfur Nt.
E.T. Hu et al. / Renewable Energy 77 (2015) 442e446 445
Then two impurity centers (four defect levels) are all considered
and Nt of Type-I and II are optimized together in Fig. 3. Both of the
range of Type-I and II are varied from 5 1015 to 5 1017 cm3. It
can be found that when Nt of Type-I is smaller than 4.5 1016 cm3
and Type-II greater than 1 1017 cm3, the efficiency will be the
highest. But the SRH model used here can't be used when impurity
concentration exceeding 1017 cm3 [6]. On the other hand, in order
to get a PCE improvement, the impurity concentration should be
close to, but not exceed the base doping (1017 cm3 in our paper).
Therefore, Nt of Type I and Type II are just set to 4 1016 cm3 and
6 1016 cm3 in the dark red region of the figure in our following
simulation.
Fig. 4 gives the QE of different defect levels. For only Type-I
being considered, the optimized value of Nt of 6.9 1016 cm3 is
used while 1 1017 cm3 is used for Type-II. In the four defect levels
Fig. 4. Quantum efficiency (QE) of different defect levels. case 4 1016 and 6 1016 cm3 are used for the Nt of Type I and II,
respectively. It can be found that unlike the undoped cell, the
infrared response is enhanced with sulfur doping. Moreover, the
1 which will result in an increase of the transition rate from VB to infrared response wavelength range of the case considering Type-I
the defect. Then the transition rate from the defect to CB will be is wider than that of considering Type-I and II. The main reason
reduced which will reduce the PCE in the end. The same behavior may be that too many doping levels enhance the recombination of
was observed for Type-II except that the highest PCE is attained carriers leading to a deterioration of the solar cell performance.
when Nt ¼ 1.0 1017 cm3. It also can be seen that the variation However, the infrared response wavelength range of the case
tendency of PCE with Nt is mainly determined by the variation of Jsc considering Type-II is narrower than that of considering Type-I and
with Nt which is shown in Fig. 2(b). The relation between Voc and Nt II. In order to get the highest PCE, the number and type of defect
is shown in Fig. 2(c). It can be found that Voc is lower than that levels should be controlled at the same time.
without Type-I or Type-II doping. However, after the doping of Because the thickness of each layer affects the transmission of
sulfur, Voc decreases slowly until the background doping of the p- photo-generated carriers, the influence of thickness of each layer
type base layer is nearly compensated by sulfur because of the on the PCE of solar cells is investigated. The results are shown in
heavy doping layer. When Nt is small, for Type-I, Jsc is bigger than Fig. 5. In Fig. 5(a) it can be found that with the increase of the
that without sulfur doping, However, for Type-II Jsc is smaller. The thickness of nþ, the PCE gradually decreases. The value of 0.3 mm is
reason may be that the impurity levels of Type-II are near the used for the successive simulation. For the p and pþ layer, the PCE
middle of the band gap which will increase the electronehole has a peak at about 80 and 12 mm respectively in Fig. 5(b) and (c). So
recombination through the defects. The same behavior is observed the thicknesses of 80 mm and 12 mm are used for the p layer and pþ
in Ref. [7]. Fig. 2(d) shows the corresponding change in the fill factor layer, respectively. It can also be found that the thickness of pþ has
with Nt. The decrease in fill factor is due to either an increase in less effect on the PCE than that of nþ and p layer. In the condition
series resistance or a decrease in shunt resistance or both [19]. that the structure of our simulation is always nþepepþ, the
Fig. 5. Influence of the thickness of nþ (a), p (b), pþ (c) on the PCE and influence of background doping concentration of p (d), nþ(e), pþ (f) on the PCE.
446 E.T. Hu et al. / Renewable Energy 77 (2015) 442e446