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SPACE Ground to Structure
PLASMA
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Figure 1 . Lumped Element Parameters for ESD Event Between a Solar Array and Cable.
References: [l] Launchspace Magazine, Major Space Losses 1994-1998, October 1998.
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Figure 9.27. Examples of upset from discharges transients pulses. 'Ile upset thresholds for representative logic families are given in Table 9.9. The upset level (e.g noise margin) for commonly used logic families vary from a few hundred milli-electron-volts to a few volts. Typical upset energy level threshold range from 1 to 50 nanojoules.
Logic Family
I X
t
D1-L I'IL IT1-L
SCL CMOS
'1- LOW
M in
0.4 5.0 NA 1 .s 3.0
5 5 I5
5.2
5 15
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CMOS CMOS
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0.4 4.0 NA
Typ
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Iligh
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4.4
4.2 6.5
3.0 4.5
50 3.8 30 2.2 140 7.0 0.17 7 600 3.4 1.5 300 6.0 250 9.0
NA 22
NA
13
Table 9.9. Typical Upset Tllresllold and Characteristics of Some Logic families
9.12 Component Damage -
Component damage is a permanent change in one or more electrical characteristics of a circuit component, Circuit components are vulnerable to thermal damage and electrical breakdown when stressed by dielectric discharge transients. The damage energy threshold for various circuit components for a 100 nS rectangulartransientpulseis logic families. shown in Figure 9.28. Thedamage threshold level ranges from 10 nJ for microwave diodes to several hundred nanojoules for various
Ttonsmlor
IT1 SIC
JFET
1145
CMOSISOS
Figure 9.28. Permanent damage energy threshold of components for 100 nS pulse. For semiconductors, the most common discharge transient thernlal runaway triggered damage mechanism is localized
resolidified melt channel across the junction once the transient is removed where the melt channel appears electrically as a low resistance shunt across the junction. Junction damage is most likely to occur when the dischargetransient reverse biases the junction and drives it into second damage thresholds that are breakdown. Forward stressed junctions also failbuttypicallyhave
three to ten timeshigher than reverse stressed junctions. For integratedcircuits,metallization burnout and gate oxide breakdown (for MOS devices) are also prominent failure tnechanisms.
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Figure 9.29. Pulse power failure depedence on pulse width for discrete semiconductors
Device 1 N750A 1 N756 1N914 1N3 600 IN4148 1N4003 2N9 18 2N2222 2N2857 2N2907A 2N3019 2N3440 'kt = k, k2 = 1/2
VBD(V,
Zener Diode Diode Diode Diode Transistor Transistor Transistor Transistor Transistor Transistor
20.4 0.096 0.18 0.01 1 2.2 0.0086 0.11 0.0085 0.1 0.44 1.1
Table 9.10. Damage Constants and Junction Breakdown Voltages for Some Typical Discrete Semiconductors.
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Power
Figure 9.30. Transient pulse failure models for transistors, diodes, and integrated circrlils Device Category Forward Bias (ohms) Reverse Bias (ohms) 0.1 1 .o Zener diodes 0.25 25.0 Signal diodes 0.05 150.0 Rectifier diodes 1 .o Low fiequency transistor (e-b) 10.0 0.2 2.0 High power transistor (e-b) Table 9.1 1. Typical Junction Bulk Resistance for Discrete Semiconductors For integrated circuits,
kl
and
k2
are determinedexperimentallywhenpossible.
For thecase
where test data is not available, typical. valuesof these coeflicients for different types of integrated circuitshavebeendetermined by tests and are given in Table 3.12. Tightintegratedcircuit to he manufacturing tolerances and standard circuit designs haveallowedintegratedcircllits
grouped by their tecl~nology into genetic failure classesand their terminals categorized into one of the following types: input terminal, output terminal, and power terminal. The IC terminal failure model consists of a resistor representing the terminals bulk representing the terminals reverse breakdown voltage.
Category
KI
l*enniIml Input Output Input Output Power 0.00216 0.00359 0.554 0.0594 0.0875 0.01x7, 0.0040 0.0393 0.152 0.0348 0.456 0.0546 0.0014 0.105 0.0743 0.0 139
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0.689 0.722 0.384
Fnlnil
VOD
(V)
7 1.3 6
I b (ohms)
16 2.4 40 18.9 20.8 25.2 15.8 30.6 15.7 7.8 8.9 9.2 11.6 10.4 13.2 5.5
Y
11L
RTL DIZ
ECL
0.508
0.555 0.580 0.706 0.576 0.44 1 0.558 0.493 0.483 0.8 19 0.543 0.509 0.714
5 5
7
Input
Output Power Input Output Power Input Output Power Input Output
I
I 1
20 0.7 0.7 30 0.G 3 7 7
MOS
Linear
0.00896 0.013 2.6 0.39 0.71) 0.04 1 0.0136 0.17 0.5 1 0.397 0.935 0.47 0.0046 0.29 1.01 0.043
I L Table 9.12. Damage Constants and Failure Parameters for Various Logic families.
From the failure tnodels for discrete semiconductorsand integrated circuits, we find the failure voltage, Vp, and failure current IF, at the device terminalsare expressed as VI;.= V, + I,R,
where VOis the terminals breakdown voltage, Re is the terminals bulk resistance and P, is the terminals failure power given previously. The conditions for failure to occur when a circuit is stressed by a discharge transients is as follows: 1 ) the dischargetransient current produced at the terminals of the transistor, diode, or integrated circuit must be equal to or exceed I& where IF is obtained from equation 9.9 above. D is a derating factorto account for statistical variations in device failure thresholds. D is 3 for P, values
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Circuit upset is a nonpermanent alteration of a circuit or component operational state thaIt is selfcorrecting or reversible by automatic or snar~ual means. Some examples of upset are provided in Figure 9.27. The conditions for upset to occur when a circuit is stressed by a discharge transient are as follows:
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