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Sputtering
Sputtering
First observations
of cathode erosion in
gas discharges
W.R. Grove 1853
Sputtering
Removal of surface material as a result of energetic particle bombardment.
First observations: W.R. Grove 1853, J.P. Gassiot and M. Faraday 1854,
1858. J. Plcker 1858. Useful for thin film coating?
First systematic studies: W. Crookes 1891, G. Granquist 1897. Independent
of target temperature.
J. Stark 1908, 1909. Hot spots? Binary elastic collisions?
Cosine emission distribution R. Seeliger 1935. Rules out the collision theory?
Crystal structure effects, G.K. Wehner 1956. Collisions back in. Sputtering
yields always decrease at high energy : 1/E.
Linear collision cascades, relation to nuclear stopping power, J. Lindhard et
al. 1963, J. Davies et al. 1960-64. P. Sigmund 1967-69.
BCA Monte Carlo, MARLOWE, TRIM. M.T. Robinson 1974, J. Biersack and
J.F. Ziegler 1974
Applications in semiconductor industry, coating industry, surface analysis,
fusion plasma physics and and space physics
Sputter deposition
Sputter deposition
Magnetron sputter deposition is very widely used and allows low pressure
discharge, high coating quality and fast deposition
1999-2001
1998-2004
Elemental mapping by static SIMS
Sputtering
Sputtering yield
atoms removed
Y ( E , )
incident particle
Differential sputtering yields
Y
Y
,
,Yq ,Y Yq
E1
1
q
105 Y 103
Sputtering
Sputtering
Spike regime
3
3
v
G (r , v , v0 , t ) Nv K (v ; v ', v '')d v ' d v '' G G ' G ''
t
d ( E , T ) Cm E mT 1 m dT ,0 m 1
F ( E , E0 ) : m ( E ) / E02
1 m
2Y
E1
FD ( E , , 0) m
cos 1
3 2 m
E11
4 NCm ( E1 U 0 )
MARLOWE
TRIM
dN Z
NZ
in
Z
dt
out
inZ YHZ out
H
ZZ
Z
d
j , 0
dt
H YHZ
YHZ
Z
,
1 YZZ
1 YZZ
in
j
out
j
Conclusions
Sputtering by particle bombartment has been observed
since 150 years. Apart from being a nuisance in many
technical systems it also has a wide range of useful
applications.
Physical sputtering is well understood today, especially
in the linear cascade regime. Monte-Carlo methods are
very useful in the single-knockon regime and with special
boundary conditions.
Physical sputtering is a central physical phenomenon in
fusion devices. For plasma modeling Monte Carlo codes
and semi-empirical fits are used and give satisfactory
results.